1-Cyclohexyloxyaethylacetat | 33931-55-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-Cyclohexyloxyaethylacetat
• 英文别名: 1-Cyclohexyloxyethyl acetate
• CAS: 33931-55-4
• 化学式: C₁₀H₁₈O₃
• 分子量: 186.251
• InChiKey: OPORRDLCVPYYLC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  13
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.9
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  -acetat 、 乙醛 、 溶剂黄146 生成 1-Cyclohexyloxyaethylacetat
  参考文献：
  名称：

  Scheeren,J.W.; Nivard,R.J.F., Recueil des Travaux Chimiques des Pays-Bas, 1971, vol. 90, p. 974 - 983

  摘要：

  DOI：

文献信息

• SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190137873A1

  公开（公告）日：2019-05-09

  The present invention can provide a salt and a resist composition including the salt, capable of producing a resist pattern with satisfactory line edge roughness (LER). A salt represented by formula (I): wherein R 1 and R 2 each represent a chain hydrocarbon group which may have a substituent, an alicyclic hydrocarbon group which may have a substituent or an aromatic hydrocarbon group which may have a substituent, or R 1 and R 2 are bonded each other to form a ring together with sulfur atoms to which they are bonded, R 3 , R 4 and R 5 each independently represent a hydrogen atom, a fluorine atom or a hydrocarbon group having 1 to 12 carbon atoms, —CH 2 — included in the hydrocarbon group may be replaced by —O— or —CO—, and A − represents a counter anion.

  本发明提供了一种盐和包括该盐的抗蚀剂组合物，能够产生具有令人满意的线边粗糙度（LER）的抗蚀图案。该盐由式（I）表示：其中R1和R2各代表可能具有取代基的链烃基，可能具有取代基的脂环烃基或可能具有取代基的芳香烃基，或者R1和R2彼此相连以形成与它们结合的硫原子一起的环，R3、R4和R5各自独立地表示氢原子、氟原子或具有1至12个碳原子的烃基，烃基中包括的—CH2—可以被—O—或—CO—所取代，A-表示反离子。
• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20190112286A1

  公开（公告）日：2019-04-18

  A salt comprising a group represented by the formula (aa):

  一种由公式（aa）所表示的群组的盐：
• RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210286261A1

  公开（公告）日：2021-09-16

  Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator, the resin having an acid-labile group including at least one selected from the group consisting of a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2):

  揭示了一种耐受组合物，包括由式（I）表示的化合物、具有酸敏基团和酸发生剂的树脂，其中具有酸敏基团的树脂包括至少从以下组中选择的一种：由式（a1-1）表示的结构单元和由式（a1-2）表示的结构单元。
• COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20210389669A1

  公开（公告）日：2021-12-16

  Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R 1 represents an alkyl group having 1 to 6 carbon atoms which may have a halogen, hydrogen or halogen atom, R 2 and R 3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 12 carbon atoms, R 4 represents a fluorine atom, an alkyl fluoride group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH 2 — included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—, R 5 represents a hydrogen atom, an alkylcarbonyl group having 2 to 6 carbon atoms or an acid-labile group, m2 represents an integer of 1 to 4, m4 represents an integer of 0 to 3, and m5 represents 1 or 2, in which 2≤m2+m4+m5≤5.

  揭示了一种由公式（I）表示的化合物，树脂和抗蚀组合物： 其中R1代表具有1至6个碳原子的烷基基团，其可以具有卤素，氢或卤素原子，R2和R3各自独立地表示氢原子或具有1至12个碳原子的碳氢基团，R4表示氟原子，具有1至6个碳原子的烷基氟化物基团或具有1至12个碳原子的烷基基团，且包括在烷基氟化物基团和烷基基团中的-CH2-可以被- O-或-CO-所取代，R5表示氢原子，具有2至6个碳原子的烷基羰基基团或酸敏感基团，m2表示1至4的整数，m4表示0至3的整数，m5表示1或2，在其中2≤m2+m4+m5≤5。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。