申请人:MEC COMPANY LTD.
公开号:US10174428B2
公开(公告)日:2019-01-08
An etchant for copper includes an acid and one or more compounds selected from the group consisting of an aliphatic noncyclic compound, an aliphatic heterocyclic compound and a heteroaromatic compound. The aliphatic noncyclic compound is a saturated aliphatic noncyclic compound (A) including only two or more nitrogen atoms as heteroatoms, and 2 to 10 carbon atoms. The aliphatic heterocyclic compound is a compound (B) including a five-, six-, or seven-membered ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring. The heteroaromatic compound is a compound (C) including a six-membered heteroaromatic ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring.
铜的蚀刻剂包括酸和一种或多种选自脂肪族非环化合物、脂肪族杂环化合物和杂芳香族化合物的化合物。脂肪族非环化合物是饱和脂肪族非环化合物 (A),只包括两个或两个以上的氮原子作为杂原子,以及 2 至 10 个碳原子。脂族杂环化合物是一种化合物(B),包括一个五元环、六元环或七元环,其中有一个或多个氮原子作为构成环的一个或多个杂原子。杂芳香族化合物是一种化合物(C),包括一个六元杂芳香环,该环具有一个或多个氮原子作为构成环的一个或多个杂原子。