2-Allyladamantane-2-carboxylic acid | 156421-34-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-Allyladamantane-2-carboxylic acid
• 英文别名: 2-Prop-2-enyladamantane-2-carboxylic acid
• CAS: 156421-34-0
• 化学式: C₁₄H₂₀O₂
• 分子量: 220.312
• InChiKey: BZQCCMQEZHVGOZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  16
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-Allyladamantane-2-carboxylic acid 、 重氮甲烷 以 乙醚 为溶剂， 反应 2.0h， 生成 methyl 2-(2-propenyl)tricyclo[3.3.1.1^3,7]decane-2-carboxylate
  参考文献：
  名称：

  Face Selection in Claisen Rearrangements

  摘要：

  An investigation is reported of the stereochemistry of the Claisen rearrangement of 2-(5-phenyl-2-adamantylidene) ethyl vinyl ether (1-Ph) and of allyl (5-fluoro-2-adamantylidene) methyl ether (2-F). Both ethers undergo the rearrangement principally with the newly forming bond at the zu face (i.e., syn to the 5-substituent), showing that this bond in the transition state is electron deficient from the standpoint of both termini. The two derivatives of the latter ether in which the one remaining hydrogen has been replaced by a phenyl group or an oxide anion function (3-F and 4-F) were also examined. In these two instances as well, the zu face of the vinyl terminus is favored; in all four cases, the ratio of stereoisomers is in the range of 1.33 to 1.56. The introduction of a negative charge at this terminus evidently fails to bring about the onset of the type of delocalization envisioned in the Anh model. Taken together with the oxy-Cope and allyl vinyl sulfoxide rearrangements studied earlier, these [3,3] sigmatropic shifts all exhibit a remarkably uniform face selectivity.

  DOI：

  10.1021/jo00091a010
• 作为产物：
  描述：

  2-金刚烷甲酸 在 sodium hydride 、 二异丙胺 作用下， 以 六甲基磷酰三胺 、 N,N-二甲基甲酰胺 、 甲苯 为溶剂， 反应 40.0h， 生成 2-Allyladamantane-2-carboxylic acid
  参考文献：
  名称：

  Face Selection in Claisen Rearrangements

  摘要：

  An investigation is reported of the stereochemistry of the Claisen rearrangement of 2-(5-phenyl-2-adamantylidene) ethyl vinyl ether (1-Ph) and of allyl (5-fluoro-2-adamantylidene) methyl ether (2-F). Both ethers undergo the rearrangement principally with the newly forming bond at the zu face (i.e., syn to the 5-substituent), showing that this bond in the transition state is electron deficient from the standpoint of both termini. The two derivatives of the latter ether in which the one remaining hydrogen has been replaced by a phenyl group or an oxide anion function (3-F and 4-F) were also examined. In these two instances as well, the zu face of the vinyl terminus is favored; in all four cases, the ratio of stereoisomers is in the range of 1.33 to 1.56. The introduction of a negative charge at this terminus evidently fails to bring about the onset of the type of delocalization envisioned in the Anh model. Taken together with the oxy-Cope and allyl vinyl sulfoxide rearrangements studied earlier, these [3,3] sigmatropic shifts all exhibit a remarkably uniform face selectivity.

  DOI：

  10.1021/jo00091a010

文献信息

• Chemical amplification type resist composition
  申请人：Yamada Airi

  公开号：US20080269506A1

  公开（公告）日：2008-10-30

  The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.

  本发明提供了一种公式(Ia)的硫鎓盐，包括一个结构单元的聚合物化合物的公式(Ib)，以及一种化学放大型正性光刻胶组合物，包括(A)至少选择自硫鎓盐的公式(Ia)、一个结构单元的聚合物化合物的公式(Ib)和硫鎓盐的公式(Ic)组成的酸发生剂；以及(B)含有酸敏感基团的结构单元的树脂，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• Chemically amplified positive resist composition
  申请人：Takemoto Ichiki

  公开号：US20060160017A1

  公开（公告）日：2006-07-20

  The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

  本发明提供了一种化学增感正性光刻胶组合物，包括(i)一种在碱性水溶液中不溶或难溶，但在酸的作用下变为可溶于碱性水溶液的聚合物，(ii)一种酸发生剂，以及(iii)式(I)的化合物。本发明还提供了一种酯衍生物，可用作化学增感正性光刻胶组合物的组分，以及制备酯衍生物的方法。
• Sulfonate and resist composition
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20040152009A1

  公开（公告）日：2004-08-05

  The present invention provides a sulfonate of the formula (I): 1 wherein Q 1 , Q 2 , Q 3 , Q 4 and Q 5 each independently represent hydrogen, alkyl having 1 to 16 carbon atoms, alkoxy having 1 to 16 carbon atoms, halogen, aryl having 6 to 12 carbon atoms, aralkyl having 7 to 12 carbon atoms, cyano, sulfide, hydroxy, nitro or a group of the formula (I′) —COO—X—Cy 1 (I′) wherein X represents alkylene and at least one —CH 2 — in the alkylene may be substituted by —O— or —S—, and Cy 1 represents alicyclic hydrocarbon having 3 to 20 carbon atoms, and A + represents a counter ion, with the proviso that at least one of Q 1 , Q 2 , Q 3 , Q 4 and Q 5 is the group of the formula (I′). The present invention also provides a chemical amplification type positive resist composition comprising a sulfonate of the formula (I) and resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid

  本发明提供了公式(I)的磺酸盐：其中Q1、Q2、Q3、Q4和Q5分别独立地表示氢、1至16个碳原子的烷基、1至16个碳原子的烷氧基、卤素、6至12个碳原子的芳基、7至12个碳原子的芳基烷基、氰基、硫化物、羟基、硝基或公式(I') - COO - X - Cy1(I')的基团，其中X表示烷基，烷基中至少有一个-CH2-可能被-O-或-S-取代，Cy1表示3至20个碳原子的脂环烃，并且A+表示一个反离子，但至少有一个Q1、Q2、Q3、Q4和Q5是公式(I')的基团。本发明还提供了一种化学放大型正性光刻胶组合物，包括公式(I)的磺酸盐和树脂，该树脂含有具有酸敏感基团的结构单元，本身在碱性水溶液中不溶或难溶，但在酸的作用下变得可溶于碱性水溶液。
• Mukherjee Ashis, Wu Gianhong, le Noble William J., J. Org. Chem, 59 (1994) N 12, S 3270-3274
  作者：Mukherjee Ashis, Wu Gianhong, le Noble William J.

  DOI：——

  日期：——
• Sulfonate and a resist composition
  申请人：Yamaguchi Satoshi

  公开号：US20050014095A1

  公开（公告）日：2005-01-20

  A sulfonate of the formula (I): wherein Q 1 , Q 2 , Q 3 , Q 4 and Q 5 each independently represents a certain substituent, and A + represents a counter ion, with the proviso that at least one of Q 1 , Q 2 , Q 3 , Q 4 and Q 5 is a group of the formula (II) wherein R 1 and R 2 each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.