N-(2,2,2-三氯-1-羟基乙基)甲基丙烯酰胺 | 14825-93-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 中文名称: N-(2,2,2-三氯-1-羟基乙基)甲基丙烯酰胺
• 英文名称: N-(1-Hydroxy-2,2,2-trichlorethyl)methacrylamid
• 英文别名: N-(2,2,2-trichloro-1-hydroxyethyl)methacrylamide；2-methyl-N-(2,2,2-trichloro-1-hydroxyethyl)prop-2-enamide
• CAS: 14825-93-5
• 化学式: C₆H₈Cl₃NO₂
• 分子量: 232.494
• InChiKey: HYIOVDDWOCTHOG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.8
• 重原子数：
  12
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  49.3
• 氢给体数：
  2
• 氢受体数：
  2

安全信息

• 海关编码：
  2924199090

反应信息

• 作为反应物：
  描述：

  N-(2,2,2-三氯-1-羟基乙基)甲基丙烯酰胺 、 三甲氧基磷 在 氯化亚砜 、 4-甲氧基苯酚 、 对苯二酚 作用下， 以 甲苯 、 Petroleum ether 为溶剂， 反应 5.0h， 以84.4%的产率得到N-(2,2,2-trichloro-1-dimethylphosphonatoethyl)methacrylamide
  参考文献：
  名称：

  WO2004/20446

  摘要：

  公开号：

文献信息

• Aqueus ink for inkjet printing
  申请人：KAO CORPORATION

  公开号：EP0791610A2

  公开（公告）日：1997-08-27

  An aqueous inkjet printing ink with excellent water resistance, wherein scorching onto a printer head scarcely occurs, the amount of a hydrophobic dye contained in an aqueous dispersion of a vinyl polymer can be increased, and sharp printed letters having deep color can be provided. The aqueous ink product for inkjet printing comprises a dispersion of a vinyl polymer obtained by copolymerizing one or more selected from a silicone macromer, an acrylamide monomer and a methacrylamide monomer (not having a salt-forming group), or a styrene macromer of a styrene homopolymer or a styrene copolymer having a polymerizable functional group at one terminal end, a polymerizable unsaturated monomer having the salt-forming group, and a monomer capable of polymerizing with these monomers in the presence of a radical polymerization initiator, a hydrophobic dye being contained in the dispersion.

  一种水性喷墨打印墨水具有极佳的耐水性，在这种墨水中，打印机头几乎不会发生烧焦现象，乙烯基聚合物水性分散体中所含的疏水性染料的量可以增加，并且可以提供具有深色的清晰打印字。用于喷墨打印的水性墨水产品包括乙烯基聚合物的分散体，该分散体通过共聚硅酮大单体、丙烯酰胺单体和甲基丙烯酰胺单体（不含成盐基团）中的一种或多种单体而获得、或苯乙烯均聚物或苯乙烯共聚物的苯乙烯大单体（其一个末端具有可聚合的官能团）、具有成盐基团的可聚合不饱和单体和在自由基聚合引发剂存在下能与这些单体聚合的单体，分散体中含有疏水性染料。
• Aqueous ink for inkjet printing
  申请人：Kao Corporation

  公开号：EP1245652A1

  公开（公告）日：2002-10-02

  An aqueous inkjet printing ink with excellent water resistance, wherein scorching onto a printer head scarcely occurs, the amount of a hydrophobic dye contained in an aqueous dispersion of a vinyl polymer can be increased, and sharp printed letters having deep color can be provided. The aqueous ink product for inkjet printing comprises a dispersion of a vinyl polymer obtained by copolymerizing one or more selected from a silicone macromer, an acrylamide. monomer and a methacrylamide monomer (not having a salt-forming group), or a styrene macromer of a styrene homopolymer or a styrene copolymer having a polymerizable functional group at one terminal end, a polymerizable unsaturated monomer having the salt-forming group, and a monomer capable of polymerizing with these monomers in the presence of a radical polymerization initiator, a hydrophobic dye being contained in the dispersion.

  一种水性喷墨打印墨水具有极佳的耐水性，在这种墨水中，打印头几乎不会出现烧焦现象，乙烯基聚合物水性分散体中所含的疏水性染料的用量可以增加，并且可以提供具有深色的清晰打印字。用于喷墨打印的水性墨水产品包括乙烯基聚合物的分散体，该分散体通过共聚硅酮大单体、丙烯酰胺单体和甲基丙烯酰胺单体中的一种或多种单体而获得。单体和甲基丙烯酰胺单体（不具有成盐基团），或苯乙烯均聚物的苯乙烯大单体或一端具有可聚合官能团的苯乙烯共聚物，具有成盐基团的可聚合不饱和单体，以及在自由基聚合引发剂存在下能与这些单体聚合的单体，分散体中含有疏水性染料。
• POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE
  申请人：Fujimi Incorporated

  公开号：EP2957613A1

  公开（公告）日：2015-12-23

  The present invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The polishing composition has a volume average particle diameter DA of grains in the polishing composition of 20 nm to 60 nm measured by dynamic light scattering at a concentration equivalent to 0.2 % abrasive content by mass.

  本发明提供了一种由磨料、水溶性聚合物和水组成的抛光组合物。通过动态光散射测量，抛光组合物中颗粒的体积平均粒径 DA 为 20 nm 至 60 nm，浓度相当于 0.2 % 的研磨剂含量（质量百分比）。
• POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE
  申请人：Fujimi Incorporated

  公开号：EP2960314A1

  公开（公告）日：2015-12-30

  This invention provides a polishing composition comprising an abrasive, a water-soluble polymer and water. The water-soluble polymer comprises a polymer A having an adsorption ratio of lower than 5 % and a polymer B having an adsorption ratio of 5 % or higher, but lower than 95 % based on a prescribed adsorption ratio measurement. Herein, the polymer B is selected from polymers excluding hydroxyethyl celluloses.

  本发明提供了一种抛光组合物，它由磨料、水溶性聚合物和水组成。水溶性聚合物包括吸附率低于 5%的聚合物 A 和根据规定的吸附率测量吸附率为 5%或更高但低于 95%的聚合物 B。其中，聚合物 B 选自不包括羟乙基纤维素的聚合物。
• COMPOSITION FOR SILICON WAFER POLISHING
  申请人：Fujimi Incorporated

  公开号：EP3007213A1

  公开（公告）日：2016-04-13

  This invention provides a silicon wafer polishing composition used in the presence of an abrasive. The composition comprises a silicon wafer polishing accelerator, an amide group-containing polymer, and water. The amide group-containing polymer has a building unit A in its main chain. The building unit A comprises a main chain carbon atom constituting the main chain of the amide group-containing polymer and a secondary amide group or a tertiary amide group. The carbonyl carbon atom constituting the secondary amide group or tertiary amide group is directly coupled to the main chain carbon atom.

  本发明提供了一种在研磨剂存在的情况下使用的硅片抛光组合物。该组合物由硅片抛光促进剂、含酰胺基聚合物和水组成。含酰胺基聚合物的主链中有一个构建单元 A。构建单元 A 包括构成含酰胺基聚合物主链的主链碳原子和二级酰胺基或三级酰胺基。构成仲酰胺基团或叔酰胺基团的羰基碳原子直接与主链碳原子相连。