申请人:Clariant International Ltd.
公开号:EP1308787A1
公开(公告)日:2003-05-07
The developer of the present invention is used in a method where a water-soluble resin coating layer is applied on a resist pattern formed by the conventional method, and the coating layer is crosslinked by an acid supplied from the resist, and the uncrosslinked area in the coating layer is dissolved and removed with a developer to thicken the resist pattern. This developer comprises an aqueous solution containing at least one surfactant selected from an N-acylsarcosinate, an N-acyl-N-methylalaninate, an N-acyltaurinate, an N-acyl-N-methyltaurinate, a fatty acid alkylol amide, and a fatty acid alkylol amide polyoxyethylene adduct.
本发明的显影剂的使用方法是:在用传统方法形成的抗蚀剂图案上涂敷一层水溶性树脂涂层,涂层被抗蚀剂提供的酸交联,涂层中未交联的区域用显影剂溶解和去除,以增厚抗蚀剂图案。这种显影剂包括一种水溶液,其中含有至少一种表面活性剂,这些表面活性剂选自 N-酰基肌氨酸酯、N-酰基-N-甲基丙氨酸酯、N-酰基脲酸酯、N-酰基-N-甲基脲酸酯、脂肪酸烷基醇酰胺和脂肪酸烷基醇酰胺聚氧乙烯加合物。