Directed self-assembly (DSA) using block copolymers (BCPs) is emerging as a viable alternative to photolithography for creating features 10 nm and smaller. Block copolymers with balanced surface energy between the polymer blocks, tunable χ, and tunable glass transition temperatures (Tg) have been formulated. The block copolymers can achieve perpendicular orientation by simple thermal annealing due to the surface energy balance between the polymer blocks, which allows avoiding solvent annealing or top-coat. The χ value can be tuned up to achieve L0 as low as 12 nm for lamellar-structured BCPs and hole/pillar size as small as 6 nm for cylinder-structured BCPs. The Tg of the BCPs can also be tuned to lower than those of PS-b-PMMA standards. The enhanced polymer chain mobility resulting from the decreased Tg of the block copolymer may help with improving the kinetics of BCP self-assembly during the thermal annealing.
使用嵌段共聚物(
BCPs)进行定向自组装(D
SA)正在成为光刻技术的一种可行替代方法,可用于制造 10 纳米及更小的特征。嵌段共聚物的聚合物嵌段之间具有平衡的表面能、可调的 χ 和可调的
玻璃化转变温度 (Tg)。由于聚合物嵌段之间的表面能平衡,嵌段共聚物可以通过简单的热退火实现垂直取向,从而避免了溶剂退火或表面涂层。对于片状结构的
BCP,χ 值可调至低至 12 nm,而对于圆柱状结构的
BCP,孔/柱尺寸可调至小至 6 nm。
BCP 的 Tg 也可调至低于 PS-b-P
MMA 标准。由于嵌段共聚物的 Tg 降低,聚合物链的流动性增强,这可能有助于改善热退火过程中
BCP 自组装的动力学。