2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)ethyl methacrylate | 1112983-03-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)ethyl methacrylate
• 英文别名: 2-[2-[(2-Methyl-2-adamantyl)oxy]-2-oxoethoxy]ethyl 2-methylprop-2-enoate
• CAS: 1112983-03-5
• 化学式: C₁₉H₂₈O₅
• 分子量: 336.428
• InChiKey: UTFKVHAGTFNINZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  24
• 可旋转键数：
  9
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.79
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  甲基丙烯酸羟乙酯 、 2-methyl-2-adamantyl bromoacetate 在 sodium hydride 作用下， 以 四氢呋喃 为溶剂， 反应 12.17h， 生成 2-(2-(2-methyl-2-adamantyloxy)-2-oxoethoxy)ethyl methacrylate
  参考文献：
  名称：

  POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND

  摘要：

  一种化合物由下面的通式（I）表示；以及具有由下面的通式（a0-1）表示的结构单元（a0）的聚合物化合物： 其中，R1表示氢原子、低碳基或卤代低碳基；A表示具有2个或更多碳原子的二价碳氢基团，可以具有取代基；B表示具有1个或更多碳原子的二价碳氢基团，可以具有取代基；R2表示酸可解离、抑制溶解的基团。

  公开号：

  US20090312573A1

文献信息

• COMPOUND HAVING ALICYCLIC STRUCTURE, (METH)ACRYLIC ACID ESTER, AND PROCESS FOR PRODUCTION OF THE (METH)ACRYLIC ACID ESTER
  申请人：Tanaka Shinji

  公开号：US20110009661A1

  公开（公告）日：2011-01-13

  Provided are an alicyclic structure-containing compound, a (meth)acrylate, and a method for producing the ester. The compound and the ester are useful as a monomer and the like for a photoresist used in semiconductor manufacturing and excellent in solubility, compatibility, defect reduction, roughness improvement, and the like, realized by using an alicyclic structure-containing compound containing a linking group having an ester bond and/or a linking group having an ether bond, a (meth)acrylate derived from the alicyclic structure-containing compound, and a method for producing the ester.

  提供了一种含有脂环结构的化合物，一种（甲基）丙烯酸酯，以及一种生产酯的方法。该化合物和酯可用作半导体制造中用于光刻胶的单体等，并通过使用含有酯键的连接基团和/或含有醚键的连接基团的脂环结构化合物衍生的（甲基）丙烯酸酯，以及生产酯的方法，实现了在溶解性、相容性、缺陷减少、粗糙度改善等方面表现出色。
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR
  申请人：Seshimo Takehiro

  公开号：US20100121077A1

  公开（公告）日：2010-05-13

  A compound represented by general formula (I); and a compound represented by general formula (b1-1). wherein Q 1 represents a divalent linkage group or a single bond; Y 1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO 2 — bond in the structure thereof; M − represents an alkali metal ion; and A + represents an organic cation.

  一个由通式(I)表示的化合物；和一个由通式(b1-1)表示的化合物。其中，Q1代表一个二价连接基团或一个单键；Y1代表一个可能带有取代基的烷基基团或一个可能带有取代基的氟代烷基基团；X代表一个含有取代基的3到30个碳原子的环状基团，并且在其结构中具有一个—SO2—键；M−代表一种碱金属离子；A+代表一个有机阳离子。
• NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Hada Hideo

  公开号：US20090162788A1

  公开（公告）日：2009-06-25

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein R X represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q 2 and Q 3 independently represents a single bond or a divalent linkage group; Y 1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z + represents an organic cation exclusive of an ion represented by general formula (w-1).

  一种抗蚀组合物，包括基础组分（A），在酸作用下在碱性显影液中表现出改变的溶解度，以及酸发生组分（B），在暴露后产生酸，酸发生组分（B）包括一个由下式（b1-1）表示的化合物组成的酸发生剂（B1）：其中RX表示一个可具有除氮原子以外的取代基的碳氢基团；Q2和Q3各自独立地表示单键或双价连接基团；Y1表示1到4个碳原子的烷基或氟代烷基；Z+表示一种有机阳离子，不包括由通式（w-1）表示的离子。
• Resist composition, method of forming resist pattern, novel compound, and acid generator
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP2060600A1

  公开（公告）日：2009-05-20

  A compound represented by general formula (I); and a compound represented by general formula (b1-1) .[Chemical Formula 1]          X-Q1-Y1-SO-3 M+     (1)          X-Q1-Y1-SO-3 A+     (b1 - 1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an -SO2- bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.

  通式(I)代表的化合物；以及通式(b1-1)代表的化合物 .[化学式 1］ X-Q1-Y1-SO-3 M+ (1) X-Q1-Y1-SO-3 A+ (b1 - 1) 其中 Q1 代表二价连接基团或单键；Y1 代表可能具有取代基的亚烷基或可能具有取代基的氟化亚烷基；X 代表可能具有取代基的 3 至 30 个碳原子的环状基团，其结构中具有 -SO2- 键；M+ 代表碱金属离子；A+ 代表有机阳离子。
• Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP2073060A1

  公开（公告）日：2009-06-24

  A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein Rx represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).

  一种抗蚀剂组合物，包括在酸作用下碱显影溶液中的溶解度会发生变化的碱成分（A）和在接触时会产生酸的酸生成成分（B），酸生成成分（B）包括由下图所示通式（b1-1）所代表的化合物组成的酸生成物（B1）： 其中 Rx 代表烃基，该烃基可能具有不包括氮原子的取代基；Q2 和 Q3 各自独立地代表单键或二价连接基；Y1 代表 1 至 4 个碳原子的亚烷基或氟化烷基；Z+ 代表不包括通式（w-1）所代表离子的有机阳离子。