METHODS OF MAKING POLYDIORGANOSILOXANE POLYOXAMIDE COPOLYMERS
申请人:Hays David S.
公开号:US20120271025A1
公开(公告)日:2012-10-25
A method of preparing polydiorganosiloxane polyoxamide copolymers is described. These copolymers have at least one polydiorganosiloxane segment and at least two aminooxalylamino groups. The method can be used in the presence or absence of a solvent. Intermediates involved in the preparation of the copolymers are also described.
Chemical mechanical planarization for tungsten-containing substrates
申请人:AIR PRODUCTS AND CHEMICALS, INC.
公开号:EP2779217A2
公开(公告)日:2014-09-17
Chemical mechanical polishing (CMP) compositions for polishing tungsten or tungsten-containing substrates comprise an abrasive, at least one solid catalyst, a chemical additive selected from the groups consisting of piperazine derivatives, salts of cyanate, and combinations thereof; and a liquid carrier. Systems and processes use the aqueous formulations for polishing tungsten or tungsten-containing substrates.
作者:Francisco J. Martínez-Martínez、Rodrigo E. Rojas-Pérez、Efrén V. García-Báez、Herbert Höpfl、Itzia I. Padilla-Martínez
DOI:10.1107/s0108270104018682
日期:2004.9.15
The ethyl oxamate group, N-C(O)-C(O)-OEt, in the title compound, alternatively called diethyl N,N':N,N'-bis(ethylene)dioxamate, C12H18N2O6, can be considered as being composed of two singly bonded amide and ester functionalities. The ethyl oxamate group is not planar. The two carbonyl groups are almost perpendicular, with an oxalyl O=C-C=O torsion angle of. 111.34 (17)degrees. The molecule is located on an inversion centre. Infinite supramolecular tapes, propagating along the b axis, are formed through soft C-H...O interactions which form a centrosymmetric R-2(2)(12) motif.