N-heterocyclic olefins (NHOs), IPrCH2 (1) and SIPrCH2 (2) (IPrCH2 = N(2,6-iPr2C6H3)CH}2CCH2 and SIPrCH2 = N(2,6-iPr2C6H3)CH2}2CCH2), react with HSiCl3 and afford IPrCH(SiHCl2) (3) and SIPrCH(SiHCl2) (4), respectively. Compounds 3 and 4 have been isolated in almost quantitative yield. Interestingly, treatment of the silylene IPr·SiCl2 with 1 also affords 3, where silylene insertion into a C–H bond is observed. Computational analysis shows a high energy barrier for silylene insertion, therefore a protonation–deprotonation mechanism is more likely.
IPr (1) 和 SIPr (2) (IPr = N(2,6-iPr2C6H3)CH}2C 和 SIPr = N(2,6-iPr2C6H3)
CH2}2 )与 HSiCl3 反应生成 IPrCH(SiHCl2) (3) 和 SIPrCH(SiHCl2) (4)。化合物 3 和 4 的分离率几乎达到了定量。有趣的是,用 1 处理
硅烷基 IPr-SiCl2,也能得到 3,并观察到
硅烷基插入到 C-H 键中。计算分析表明,
硅烷基插入的能量障碍很高,因此质子化-质子化机理更有可能发生。