(+/-)-4-ethoxy-2-methyl-butyric acid | 79090-49-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: (+/-)-4-ethoxy-2-methyl-butyric acid
• 英文别名: (+/-)-4-Aethoxy-2-methyl-buttersaeure；4-Ethoxy-2-methylbutanoic acid
• CAS: 79090-49-6
• 化学式: C₇H₁₄O₃
• 分子量: 146.186
• InChiKey: ORTPGAOOVWWXPK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.9
• 重原子数：
  10
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  (+/-)-4-ethoxy-2-methyl-butyric acid 在 sodium azide 、 氯仿 、 硫酸 作用下， 生成 3-ethoxy-1-methyl-propylamine
  参考文献：
  名称：

  Sutton; Data, Journal of the American Pharmaceutical Association (1912), 1952, vol. 41, p. 328,331

  摘要：

  DOI：
• 作为产物：
  描述：

  2-Ethoxyethyl-methyl-malonsaeurediethylester 在 氢氧化钾 作用下， 生成 (+/-)-4-ethoxy-2-methyl-butyric acid
  参考文献：
  名称：

  Sutton; Data, Journal of the American Pharmaceutical Association (1912), 1952, vol. 41, p. 328,331

  摘要：

  DOI：

文献信息

• SQUARYLIUM COMPOUND, METHOD FOR PRODUCING THE SAME AND INFRARED ABSORBENT
  申请人：KATO Shunya

  公开号：US20110245538A1

  公开（公告）日：2011-10-06

  Provide is a compound having absorbability in an infrared region, excellent invisibility and robustness. The compound is a squarylium compound represented Formula (1): wherein, R 1 and R 2 represent an alkyl group, cycloalkyl group, aryl group, or heteroaryl group, which may be substituted by a substituent; R 3 and R 4 represent a hydrogen atom or alkyl group; X 1 and X 2 represent an oxygen atom or —NR 5 —, in which R 5 represents a hydrogen atom or alkyl group; Y 1 , Y 2 , Y 3 and Y 4 represent a halogen atom, alkyl group, cycloalkyl group, aryl group, heteroaryl group, arylcarbonyloxy group, or alkylcarbonyloxy group; a plurality of Y 1 's, Y 2 's, Y 3 's, or Y 4 's may be bonded to form a ring structure, respectively; Y 1 and Y 2 , or Y 3 and Y 4 may be bonded to form a ring structure; n 1 and n 4 represent an integer of 0 to 3; and n 2 and n 3 represent an integer of 0 to 2.

  提供一种在红外区域具有吸收性、优异的隐形性和稳定性的化合物。该化合物是一种苯并二氮杂环庚酮化合物，表示为式（1）：其中，R1和R2代表烷基、环烷基、芳基或杂芳基，可以被取代；R3和R4代表氢原子或烷基；X1和X2代表氧原子或—NR5—，其中R5代表氢原子或烷基；Y1、Y2、Y3和Y4代表卤素原子、烷基、环烷基、芳基、杂芳基、芳基羰氧基或烷基羰氧基；多个Y1、Y2、Y3或Y4可以分别连接形成环结构；Y1和Y2，或Y3和Y4可以连接形成环结构；n1和n4代表0到3的整数；n2和n3代表0到2的整数。
• Patternable low dielectric constant materials and their use in ULSI interconnection
  申请人：Lin Qinghuang

  公开号：US20060105181A1

  公开（公告）日：2006-05-18

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本文所披露的可图案化低-k介电材料是具有一种或多种酸敏感的可成像功能基团的功能化聚合物。
• Copolymer for use in chemical amplification resists
  申请人：——

  公开号：US20030186160A1

  公开（公告）日：2003-10-02

  A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and has improved sensitivity and resolution. In one embodiment, the copolymer is comprised of an &agr;-cyano- or an &agr;-trifluoro-methacrylate monomer unit and a vinyl ether monomer unit. A lithographic photoresist composition containing the fluorinated copolymer is also provided, as is a process for using the composition to generate resist images on a substrate, i.e., in the manufacture of integrated circuits or the like.

  提供一种用于光刻光阻组合物的共聚物，特别是化学增强型光刻光阻。在一个优选实施例中，该共聚物在深紫外辐射下具有相当的透明度，即波长小于250纳米的辐射，包括157纳米、193纳米和248纳米的辐射，并具有改进的灵敏度和分辨率。在一个实施例中，该共聚物由α-氰基或α-三氟甲基丙烯酸甲酯单体单元和乙烯醚单体单元组成。还提供了含氟共聚物的光刻光阻组合物，以及使用该组合物在基板上生成抗蚀图案的工艺，即在集成电路或类似器件的制造中。
• Monocyclic anilide spirohydantoin cgrp receptor antagonists
  申请人：Bell M. Ian

  公开号：US20060148779A1

  公开（公告）日：2006-07-06

  The present invention is directed to compounds that are antagonists of CGRP receptors and that are useful in the treatment or prevention of diseases in which the CGRP is involved, such as headache, migraine and cluster headache. The invention is also directed to pharmaceutical compositions comprising these compounds and the use of these compounds and compositions in the prevention or treatment of such diseases in which CGRP is involved.

  本发明涉及与CGRP受体拮抗的化合物，这些化合物在治疗或预防CGRP参与的疾病，如头痛、偏头痛和群头痛方面是有用的。本发明还涉及包含这些化合物的药物组合物，以及在预防或治疗CGRP参与的这些疾病中使用这些化合物和组合物的用途。
• Patternable low dielectric constsnt materials and their use in ULSI interconnection
  申请人：International Business Machines Corporation

  公开号：US20040137241A1

  公开（公告）日：2004-07-15

  The present invention relates to ultra-large scale integrated (ULSI) interconnect structures, and more particularly to patternable low dielectric constant (low-k) materials suitable for use in ULSI interconnect structures. The patternable low-k dielectrics disclosed herein are functionalized polymers that having one or more acid-sensitive imageable functional groups.

  本发明涉及超大规模集成（ULSI）互连结构，更具体地涉及适用于ULSI互连结构的可图案化低介电常数（低-k）材料。本文所披露的可图案化低-k介电材料是具有一种或多种酸敏感可成像功能基团的功能化聚合物。