申请人:Ciba Specialty Chemicals Corporation
公开号:US06596445B1
公开(公告)日:2003-07-22
Oximeester compounds of the formulae I, II, III and IV
wherein
R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
化合物I、II、III和IV的肟酸酯,其中R1为苯基,C1-C20烷基或C2-C20烷基(可选地被—O—中断),C2-C20酰基或苯甲酰基,或R1为C2-C12烷氧羰基或苯氧羰基;R1'为C2-C12烷氧羰基,或R1'为苯氧羰基,或R1'为—CONR10R11或CN;R2为C2-C12酰基,C4-C6烯酰基,苯甲酰基,C2-C6烷氧羰基或苯氧羰基;R3、R4、R5、R6和R7为氢、卤素、C1-C12烷基、环戊基、环己基、苯基、苄基、苯甲酰基、C2-C12酰基、C2-C12烷氧羰基、苯氧羰基或OR8、SR9、SOR9、SO2R9或NR10R11基团;R4'、R5'和R6'为氢、卤素、C1-C12烷基、环戊基、环己基、苯基、苄基、苯甲酰基、C2-C12酰基、C2-C12烷氧羰基、苯氧羰基,或为OR8、SR9、SOR9、SO2R9、NR10R11基团;但至少有R3、R4、R5、R6、R7、R'4、R'5和R'6中的一个为OR8、SR9或NR10R11;R8、R9、R10和R11例如为氢、C1-C12烷基、苯基;适用于自由基聚合反应的光引发剂。