MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMPOSITION INCLUDING THE SAME
申请人:LEE Jung-Youl
公开号:US20080102402A1
公开(公告)日:2008-05-01
A photoresist monomer having a sulfonyl group, a polymer thereof and a photoresist composition containing the same are disclosed. The photoresist monomer is represented by following Formula.
wherein, R* is a hydrogen atom or a methyl group, R
1
and R
2
are independently a C
1
˜C
20
alkyl group, a C
4
˜C
20
cycloalkyl group, a C
6
˜C
20
aryl group or a C
7
˜C
20
arylalkyl group, one of R
1
and R
2
may not exist, and R
1
and R
2
can be connected to form a ring.