1,1,1,2,2,3,3,4,4-nonafluoroheptane | 154381-51-8

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 英文名称: 1,1,1,2,2,3,3,4,4-nonafluoroheptane
• CAS: 154381-51-8
• 化学式: C₇H₇F₉
• 分子量: 262.118
• InChiKey: MDZDBKLCYXUTQA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.6
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为产物：
  描述：

  4,4,5,5,6,6,7,7,7-九氟-1-庚烯 在 Rh on carbon 氢气 作用下， 25.0 ℃ 、10.13 MPa 条件下， 反应 60.0h， 生成 1,1,1,2,2,3,3,4,4-nonafluoroheptane
  参考文献：
  名称：

  碳氢化合物在氢氟烃中的溶解度估算

  摘要：

  已经开发出用于氢氟碳化合物（HFC）的新溶解度参数SP（SP = 1.175 ln（np）+ 0.025 H -0.063 F -0.028α-0.018β，其中np取决于摩尔体积和摩尔折射率；H和F分别是分子中氢和氟的数目；而α和β分别是HCF和HCCF连接的数目。SP的价值HFC已被用来预测HFC在25°C下对于各种碳氢化合物是否是良好的溶剂。在异构HFC族中，对烃具有最大溶解能力的单个HFC是那些氟与氢的分离度最大的HFC。将希尔德布兰德溶解度参数δ与半经验SP值进行比较。

  DOI：

  10.1016/0022-1139(93)02960-m

文献信息

• ANIMAL ECTOPARASITE CONTROL COMPOSITION
  申请人：NISHIGUCHI Naonobu

  公开号：US20110160251A1

  公开（公告）日：2011-06-30

  The present invention provides an animal ectoparasite control composition containing an insecticidal component and an adipate, and a method of controlling an animal ectoparasite which comprises administering an effective amount of the animal ectoparasite control composition to an animal.

  本发明提供了一种含有杀虫成分和己二酸酯的动物外寄生虫控制组合物，以及一种控制动物外寄生虫的方法，包括向动物施用有效量的动物外寄生虫控制组合物。
• Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device
  申请人：JSR CORPORATION

  公开号：US10392699B2

  公开（公告）日：2019-08-27

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.

  本发明涉及：一种生产具有凹陷图案的结构的方法；一种树脂组合物；一种形成导电薄膜的方法；一种电子电路；以及一种电子设备。生产具有凹陷图案的结构的方法包括以下步骤(i)和(ii)，凹陷图案的薄膜厚度比步骤(i)中获得的涂膜薄 5%至小于 90%： (i) 使用树脂组合物在结构的非平面上形成涂膜的步骤，该树脂组合物包括含酸可分解基团的聚合物和酸生成物；以及 (ii) 通过对涂膜部分的规定部分进行辐射形成凹槽的步骤。
• Solvent blend for use in high purity precursor removal
  申请人：AIR PRODUCTS AND CHEMICALS, INC.

  公开号：EP1193309B1

  公开（公告）日：2004-11-03
• FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20110151381A1

  公开（公告）日：2011-06-23

  A fluorinated monomer has formula (1) wherein R 1 is H, F, methyl or trifluoromethyl, R 2 is a monovalent hydrocarbon group which may have halogen or oxygen, A is a divalent hydrocarbon group, and k 1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.
• METHOD FOR MANUFACTURING STRUCTURE HAVING RECESSED PATTERN, RESIN COMPOSITION, METHOD FOR FORMING ELECTROCONDUCTIVE FILM, ELECTRONIC CIRCUIT, AND ELECTRONIC DEVICE
  申请人：JSR CORPORATION

  公开号：US20170306481A1

  公开（公告）日：2017-10-26

  The present invention relates to: a method of producing a structure having a recessed pattern; a resin composition; a method of forming an electroconductive film; an electronic circuit; and an electronic device. The method of producing a structure having a recessed pattern includes the following steps (i) and (ii), and the recessed pattern has a film thickness that is thinner by 5% to less than 90% with respect to that of a coating film obtained in the step (i): (i) the step of forming a coating film on a non-flat surface of a structure using a resin composition which includes an acid-dissociable group-containing polymer and an acid generator; and (ii) the step of forming a recess by subjecting a prescribed part of a portion of the coating film to irradiation with radiation.