Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor
申请人:Koyama Hiroshi
公开号:US20060058480A1
公开(公告)日:2006-03-16
A polymerizable monomer of the present invention is represented by the following formula (1);
R
1
, R
2
and R
3
are each a hydrogen atom, a fluorine atom, an alkyl group or a fluoroalkyl group, W is a single bond or a linkage group and n is 0 or 1, where at least one of R
1
, R
2
and R
3
is a fluorine atom or a fluoroalkyl group when n=
1;
and the ring in the formula may have a substituent. The polymerizable monomer of the present invention can provide an appropriate hydrophilicity or hydrophilicity and transparency to a photoresist polymer.