Novel sulfonyldiazomethanes, photoacid generators, resist compositions, and patterning process
申请人:——
公开号:US20040167322A1
公开(公告)日:2004-08-26
A chemical amplification type resist composition comprising a specific benzenesulfonyldiazomethane containing a long-chain alkoxyl group at the 2-position on benzene ring has many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development and is thus suited for microfabrication.
一种化学放大型抗蚀组合物,包括在苯环上的2-位含有长链烷氧基基团的特定苯磺酰二氮甲烷,具有许多优点,包括提高分辨率,改善焦点宽度,即使在长期PED上也减少线宽变化或形状退化,涂层、显影和剥离后减少残留物,并在显影后改善图案轮廓,因此适用于微加工。