triethylammonium 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonate | 1450877-37-8

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: triethylammonium 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonate
• 英文别名: 1,1,3,3,3-Pentafluoro-2-hydroxypropane-1-sulfonate;triethylazanium；1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonate;triethylazanium
• CAS: 1450877-37-8
• 化学式: C₃H₃F₅O₄S*C₆H₁₅N
• 分子量: 331.304
• InChiKey: MIIRVZWIZQJCCC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.02
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  90.2
• 氢给体数：
  2
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  甲基丙烯酸酐 、 triethylammonium 1,1,3,3,3-pentafluoro-2-hydroxypropane-1-sulfonate 在 4-二甲氨基吡啶 、 三乙胺 作用下， 以 二氯甲烷 为溶剂， 以70%的产率得到triethylammonium 1,1,3,3,3-pentafluoro-2-methacryloyloxypropane-1-sulfonate
  参考文献：
  名称：

  JP5790631

  摘要：

  公开号：

文献信息

• POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20130224659A1

  公开（公告）日：2013-08-29

  A sulfonic acid anion-containing polymer having an alkylsulfonium cation not in covalent bond thereto can be readily prepared by reacting a sulfonic acid anion-containing polymer having an ammonium or metal cation with an alkylsulfonium salt under mild conditions. A resist composition comprising the inventive polymer is effective for suppressing acid diffusion since the sulfonium salt is bound to the polymer backbone. When processed by the ArF lithography, the polymer exhibits a lower absorption at the exposure wavelength than the triarylsulfonium salt form PAGs, resulting in improved resolution, mask fidelity, and LWR.

  一种含有烷基磺酸铵阳离子的聚合物，其烷基磺酸铵阳离子与聚合物主链上的其他部分不形成共价键，可以通过在温和条件下将含有铵或金属阳离子的磺酸根聚合物与烷基磺酸盐反应而容易制备。由该聚合物构成的抗蚀剂组合物对抑制酸扩散有效，因为磺酸盐与聚合物主链相结合。当通过ArF光刻工艺进行处理时，该聚合物在曝光波长处的吸收较三芳基磺酸盐形式的PAGs低，从而提高了分辨率、掩模保真度和LWR。
• Preparation of polymer, resulting polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2631253A2

  公开（公告）日：2013-08-28

  A sulfonic acid anion--containing polymer having a triarylsulfonium cation is prepared by (1) preparing a sulfonic acid anion-containing polymer having an ammonium or metal cation not bound thereto, (2) purifying the polymer by water washing or crystallization, and (3) then reacting the polymer with a triarylsulfonium salt. A resist composition comprising the inventive polymer is effective for controlling acid diffusion since the sulfonium salt is bound to the polymer backbone.

  具有三芳基锍阳离子的含磺酸阴离子聚合物的制备方法是：(1) 制备具有未结合铵或金属阳离子的含磺酸阴离子聚合物；(2) 通过水洗或结晶提纯聚合物；(3) 然后使聚合物与三芳基锍盐反应。由于锍盐与聚合物骨架结合，因此包含本发明聚合物的抗蚀剂组合物可有效控制酸扩散。
• Polymer, making method, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2664633A1

  公开（公告）日：2013-11-20

  A sulfonic acid anion-containing polymer having an alkylsulfonium cation not in covalent bond thereto can be readily prepared by reacting a sulfonic acid anion-containing polymer having an ammonium or metal cation with an alkylsulfonium salt under mild conditions. A resist composition comprising the inventive polymer is effective for suppressing acid diffusion since the sulfonium salt is bound to the polymer backbone. When processed by the ArF lithography, the polymer exhibits a lower absorption at the exposure wavelength than the triarylsulfonium salt form PAGs, resulting in improved resolution, mask fidelity, and LWR.

  将具有铵或金属阳离子的含磺酸阴离子聚合物与烷基锍盐在温和的条件下进行反应，可以很容易地制备出具有非共价键烷基锍阳离子的含磺酸阴离子聚合物。由于锍盐与聚合物骨架结合，因此包含本发明聚合物的抗蚀剂组合物能有效抑制酸扩散。用 ArF 光刻技术处理时，该聚合物在曝光波长处的吸收率低于三芳基锍盐形式的 PAG，从而提高了分辨率、掩模保真度和低温再生率。
• PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20130224660A1

  公开（公告）日：2013-08-29

  A sulfonic acid anion-containing polymer having a triarylsulfonium cation is prepared by (1) preparing a sulfonic acid anion-containing polymer having an ammonium or metal cation not bound thereto, (2) purifying the polymer by water washing or crystallization, and (3) then reacting the polymer with a triarylsulfonium salt. A resist composition comprising the inventive polymer is effective for controlling acid diffusion since the sulfonium salt is bound to the polymer backbone.
• US8957160B2
  申请人：——

  公开号：US8957160B2

  公开（公告）日：2015-02-17