(3,5-二羟基苯基)-苯基甲酮 | 38009-30-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: (3,5-二羟基苯基)-苯基甲酮
• 英文名称: 3,5-dihydroxy-benzophenone
• 英文别名: 3,5-Dihydroxy-benzophenon；Benzophenone, 3,5-dihydroxy-；(3,5-dihydroxyphenyl)-phenylmethanone
• CAS: 38009-30-2
• 化学式: C₁₃H₁₀O₃
• 分子量: 214.221
• InChiKey: VABRJGOVVLYNCR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  16
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  3

安全信息

• 海关编码：
  2914501900

反应信息

• 作为反应物：
  描述：

  (3,5-二羟基苯基)-苯基甲酮 在 palladium on activated charcoal 氢气 作用下， 生成 5-苄基苯-1,3-二醇
  参考文献：
  名称：

  Zymalkowski,F.; Kothari,M., Archiv der Pharmazie und Berichte der Deutschen Pharmazeutischen Gesellschaft, 1970, vol. 303, p. 667 - 675

  摘要：

  DOI：
• 作为产物：
  描述：

  3,5-二乙酰氧基二苯甲酮 在 sodium hydroxide 作用下， 生成 (3,5-二羟基苯基)-苯基甲酮
  参考文献：
  名称：

  Huls; Hubert, Bulletin des Societes Chimiques Belges, 1956, vol. 65, p. 596,602

  摘要：

  DOI：

文献信息

• [EN] COMPOSITIONS AND METHODS FOR INHIBITION OF CATHEPSINS<br/>[FR] COMPOSITIONS ET PROCÉDÉS D'INHIBITION DE CATHEPSINES
  申请人：MATEON THERAPEUTICS INC

  公开号：WO2017030983A1

  公开（公告）日：2017-02-23

  This present disclosure is directed to compound of Formula I and methods of using these compounds in the treatment of conditions in which modulation of a cathepsin, particularly cathepsin L, cathepsin K, and/or cathepsin B, will be therapeutically useful. Formula I: or a solvate or pharmaceutically acceptable salt thereof. Each of Rl -Rl 0 are independently selected from the group consisting of: hydrogen, alkoxy, halo, hydroxy, phosphate, phosphate salts, disodium phosphate, diphosphate dimer, diphosphate dimer salt, and sodium diphosphate dimer with at least one of R1 -R10 is a phosphate or diphosphate dimer group.

  本公开涉及化合物I的公式以及在治疗需要调节蛋白酶的情况下使用这些化合物的方法，特别是蛋白酶L、蛋白酶K和/或蛋白酶B。公式I：或其溶剂或药用可接受盐。R1-R10中的每一个独立地选择自羟基、烷氧基、卤素、羟基、磷酸酯、磷酸盐、二钠磷酸盐、二磷酸二聚体、二磷酸二聚体盐和含有R1-R10中至少一个为磷酸酯或二磷酸二聚体基团的羟基。
• Cannabinoid derivatives, methods of making, and use thereof
  申请人：Moore M. Bob

  公开号：US20070167514A1

  公开（公告）日：2007-07-19

  1′-substituted cannabinoid derivatives of delta-8-tetrahydrocannabinol, delta-9-tetrahydrocannabinol, and delta-6a-10a-tetrahydrocannabinol that have affinity for the cannabinoid receptor type-1 (CB-1) and/or cannabinoid receptor type-2 (CB-2). Compounds having activity as either agonists or antagonists of the CB-1 and/or CB-2 receptors can be used for treating CB-1 or CB-2 mediated conditions.

  这段话的翻译如下： 这是一些1'-取代的大麻素衍生物，包括delta-8-四氢大麻酚、delta-9-四氢大麻酚和delta-6a-10a-四氢大麻酚，它们具有与大麻素受体类型1（CB-1）和/或大麻素受体类型2（CB-2）的亲和力。这些化合物作为CB-1和/或CB-2受体的激动剂或拮抗剂可以用于治疗CB-1或CB-2介导的疾病。
• Resist compositions, their preparation and use for patterning processes
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP0908783A1

  公开（公告）日：1999-04-14

  A resist composition comprising (A) an organic solvent; (B) at least two polymers with weight average molecular weights of 1,000-500,000, which have at least one type of acid labile group and are crosslinked within a molecule and/or between molecules with crosslinking groups having C-O-C linkages; and (C) a photoacid generator is sensitive to high-energy radiation, has excellent sensitivity, resolution, and plasma etching resistance, and provides resist patterns of outstanding thermal stability and reproducibility. Patterns obtained with this resist composition are less prone to overhanging and have excellent dimensional controllability. The resist composition is suitable as a micropatterning material for VLSI fabrication because it has a low absorption at the exposure wavelength of a KrF excimer laser, thus enabling the easy formation of a finely defined pattern having sidewalls perpendicular to the substrate.

  一种抗蚀剂组合物包含（A）一种有机溶剂；（B）至少两种重量平均分子量在 1,000-500,000 之间的聚合物，这些聚合物具有至少一种酸易变基团，并在分子内和/或分子之间用具有 C-O-C 连接的交联基团交联；以及（C）一种光酸发生器，这种光酸发生器对高能辐射敏感，具有出色的灵敏度、分辨率和抗等离子刻蚀能力，并能提供具有出色热稳定性和可重复性的抗蚀图案。使用这种抗蚀剂组合物获得的图案不易悬空，具有极佳的尺寸可控性。这种抗蚀剂组合物适合用作超大规模集成电路制造中的微图案材料，因为它在 KrF 准分子激光的曝光波长下具有低吸收率，从而能够轻松形成具有垂直于基底侧壁的精细图案。
• Resist compositions and pattering process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1039346A1

  公开（公告）日：2000-09-27

  A resist composition comprising a dendritic or hyperbranched polymer of a phenol derivative having a weight average molecular weight of 500-10,000,000 has an excellent resolution, reduced line edge roughness, and dry etching resistance and is useful as a chemical amplification type resist composition which may be either positive or negative working.

  一种抗蚀剂组合物由重量平均分子量为 500-10,000,000 的苯酚衍生物的树枝状或超支化聚合物组成，具有极佳的分辨率、降低的线边缘粗糙度和耐干蚀刻性，可用作化学放大型抗蚀剂组合物，既可正向工作，也可负向工作。
• Onium salts, photoacid generators for resist compositions, and patterning process
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：EP1077391A1

  公开（公告）日：2001-02-21

  Onium salts of the formula (1) are novel. R1 is C1-10 alkyl or C6-14 aryl, R2 is H or C1-6 alkyl, p is an integer of 1 to 5, q is an integer of 0 to 4, p+q = 5, R3 is C1-10 alkyl or C6-14 aryl, M is a sulfur or iodine atom, and "a" is equal to 3 or 2. A chemical amplification type resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and stripping, and improved pattern profile after development.

  式（1）的铌盐是新颖的。 R1是C1-10烷基或C6-14芳基，R2是H或C1-6烷基，p是1至5的整数，q是0至4的整数，p+q=5，R3是C1-10烷基或C6-14芳基，M是硫或碘原子，"a "等于3或2。由作为光酸发生器的鎓盐组成的化学放大型抗蚀剂组合物适用于微细加工，特别是深紫外光刻，因为它具有许多优点，包括提高了分辨率，即使在长期的 PED 上也能最大限度地减少线宽变化或形状退化，最大限度地减少涂布、显影和剥离后的缺陷，以及改善显影后的图案轮廓。