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Undecanoic acid; compound with ammonia | 32582-95-9

中文名称
——
中文别名
——
英文名称
Undecanoic acid; compound with ammonia
英文别名
Ammonium undecanoate;azanium;undecanoate
Undecanoic acid; compound with ammonia化学式
CAS
32582-95-9
化学式
C11H22O2*H3N
mdl
——
分子量
203.325
InChiKey
JHGIPWYHRMICQT-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.76
  • 重原子数:
    14
  • 可旋转键数:
    9
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.91
  • 拓扑面积:
    38.3
  • 氢给体数:
    2
  • 氢受体数:
    3

反应信息

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文献信息

  • Photosensitive composition and method for forming pattern using the same
    申请人:FUJI PHOTO FILM CO., LTD.
    公开号:EP1612602A2
    公开(公告)日:2006-01-04
    A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.
    本发明提供了一种可用于集成电路等半导体的制造步骤、液晶和热敏头等电路板的制造以及其他制造步骤,并具有出色的分辨率和线边粗糙度的正向工作光敏组合物,以及使用该组合物形成图案的方法,该组合物是一种光敏组合物,其中含有(A)具有特定基团的重复单元的树脂,其在碱性显影剂中的溶解度在酸的作用下会增加,以及使用该组合物形成图案的方法。
  • Aqueous pigment dispersions
    申请人:LANDA LABS (2012) LTD.
    公开号:US11479687B2
    公开(公告)日:2022-10-25
    There are disclosed aqueous pigment dispersions containing dispersant-improving-agents, and methods of preparing and using the same.
    本文公开了含有分散剂改进剂的水性颜料分散体及其制备和使用方法。
  • Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
    申请人:FUJIFILM Corporation
    公开号:EP1621927B1
    公开(公告)日:2018-05-23
  • IMPROVED AQUEOUS PIGMENT DISPERSIONS
    申请人:Landa Labs (2012) Ltd.
    公开号:EP3464489A1
    公开(公告)日:2019-04-10
  • POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME
    申请人:FUJIFILM Corporation
    公开号:US20160370701A1
    公开(公告)日:2016-12-22
    A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.
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