Photochemical Rearrangement of 2-Nitrophenyl Phenyl Sulfoxide to 2-Nitrosophenyl Phenyl Sulfone
作者:Rikuhei Tanikaga、Aritsune Kaji
DOI:10.1246/bcsj.46.3814
日期:1973.12
Irradiation of 2-nitrophenyl phenyl sulfoxide (I) gave 2-nitrosophenyl phenyl sulfone (II) as the sole product. The rearrangement was not affected by a quencher, but took a different course in the presence of a sensitizer or a halogen-containing solvent. When I with an electron-donating substituent at a 4′-position or electron-withdrawing one at a 4-position was irradiated, the corresponding II was
2-硝基苯基苯基亚砜(I)的辐照得到2-亚硝基苯基苯基砜(II)作为唯一产物。重排不受猝灭剂的影响,但在敏化剂或含卤素溶剂的存在下采取不同的过程。当在 4'-位带有给电子取代基的 I 或在 4-位带有吸电子取代基的 I 被照射时,相应的 II 以较低的产率获得。2-硝基苯基苯硫醚是光化学稳定的。结果表明,在 I 的激发单线态下,硝基的氧阴离子攻击正硫原子,发生氧转移。