RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME
申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20170045820A1
公开(公告)日:2017-02-16
A composition for forming a resist underlayer film which make possible to form a desired high-adhesion resist pattern. A resist underlayer film-forming composition for lithography containing a polymer having the following structure Formula (1) or (2) at a terminal of a polymer chain, crosslinker, compound promoting crosslinking reaction, and organic solvent.
(wherein R
1
is a C
1-6
alkyl group optionally having a substituent, phenyl group, pyridyl group, halogeno group, or hydroxy group, R
2
is a hydrogen atom, a C
1-6
alkyl group, hydroxy group, halogeno group, or ester group of —C(═O)O—X wherein X is a C
1-6
alkyl group optionally having a substituent, R
3
is a hydrogen atom, a C
1-6
alkyl group, hydroxy group, or halogeno group, R
4
is a direct bond or divalent C
1-8
organic group, R
5
is a divalent C
1-8
organic group, A is an aromatic ring or heteroaromatic ring, t is 0 or 1, and u is 1 or 2.)