1-piperidinecarboxylic acid 1-(2-anthraquinoneyl)ethyl ester | 1228312-09-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 蒽
• 英文名称: 1-piperidinecarboxylic acid 1-(2-anthraquinoneyl)ethyl ester
• 英文别名: 1-(2-anthraquinonyl)ethyl 1-piperidinecarboxylate；1-(9,10-Dioxoanthracen-2-yl)ethyl piperidine-1-carboxylate
• CAS: 1228312-09-1
• 化学式: C₂₂H₂₁NO₄
• 分子量: 363.413
• InChiKey: DYSNKRCLJFFBNV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  27
• 可旋转键数：
  3
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.32
• 拓扑面积：
  63.7
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2-(1-bromoethyl)anthraquinone 在 水 、 silver nitrate 作用下， 以 N,N-二甲基甲酰胺 、 丙酮 为溶剂， 反应 3.0h， 生成 1-piperidinecarboxylic acid 1-(2-anthraquinoneyl)ethyl ester
  参考文献：
  名称：

  PHOTOBASE GENERATOR

  摘要：

  本发明旨在提供当受长波长光（活性能量射线）照射时易于产生碱的新化合物，包含这些化合物的光碱发生器以及光碱生成方法，本发明涉及由通式[1]表示的化合物，包含这些化合物的光碱发生器以及光碱生成方法：（其中，Ar代表从蒽基团、蒽醌基团和芘基团中选择的具有特定结构的任何基团；R1和R2各自独立地代表氢原子或具有1至10个碳原子的直链、支链或环烷基基团，或表示能够与它们结合的氮原子形成含氮原子的脂环烷基环或含氮原子的芳香环，这些环具有3至8个碳原子，可能有取代基；R3和R4各自独立地代表氢原子，具有1至10个碳原子的直链、支链或非环烷基基团）。

  公开号：

  US20110233048A1

文献信息

• COMPOSITION FOR WATER-REPELLENT TREATMENT OF SURFACE, AND METHOD FOR WATER-REPELLENT TREATMENT OF SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAME
  申请人：Wako Pure Chemical Industries, Ltd.

  公开号：EP2615633A1

  公开（公告）日：2013-07-17

  The purpose of the present invention to provide: a composition which can be used for water-repellent treating of the entire surface of a semiconductor substrate having a pattern formed by laminating a Si-containing insulating layer and a metal layer, at one time; and a method for water-repellent treatment of the semiconductor substrate surface using the composition. The present invention relates to: (1) a composition for water-repellent treatment of a semiconductor substrate surface comprising a) at least one kind of a compound selected from the group consisting of a long-chain alkyl tertiary amine and a long-chain alkyl ammonium salt, b) a base or an acid generating agent, having a condensed ring structure or forming a condensed ring structure by generating a base or an acid and c) a polar organic solvent, and (2) a method for water-repellent treatment of the semiconductor substrate surface having the pattern formed by laminating the Si-containing insulating layer and the metal layer, using the composition.

  本发明的目的是：提供一种组合物，该组合物可用于一次性对具有通过层叠含硅绝缘层和金属层而形成的图案的半导体衬底的整个表面进行憎水处理；以及一种使用该组合物对半导体衬底表面进行憎水处理的方法。 本发明涉及(1) 一种用于对半导体衬底表面进行憎水处理的组合物，该组合物包含 a) 至少一种选自由长链烷基叔胺和长链烷基铵盐组成的组的化合物；b) 碱或酸生成剂、(2) 使用该组合物对具有通过层压含硅绝缘层和金属层而形成的图案的半导体衬底表面进行憎水处理的方法。
• RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20130115555A1

  公开（公告）日：2013-05-09

  There are provided a method of forming a resist pattern includes: a step ( 1 ) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step ( 2 ) in which the resist film 2 is subjected to exposure; a step ( 3 ) in which baking is conducted after the step ( 2 ); and a step ( 4 ) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2 b of the resist film 2 has been dissolved and removed, and the resist composition used in the step ( 1 ).
• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND NOVEL COMPOUND
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20130177854A1

  公开（公告）日：2013-07-11

  A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R 1 represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X 1 represents divalent linking group; X 2 represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q 1 and Q 2 represents F or fluorinated alkyl group; and W + represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H 2 N + (X 2 )—X 1 —Y—O-A-C(Q 1 )(Q 2 )—SO 3 − generated by decomposition upon exposure].
• ADHESIVE COMPOSITION AND DISPLAY DEVICE
  申请人：SAMSUNG DISPLAY CO., LTD.

  公开号：US20170025485A1

  公开（公告）日：2017-01-26

  An adhesive composition includes: a binder component; a photo-initiator component; and an anaerobic-initiator component. The binder component includes a monomer, an oligomer, and a plasticizer; the photo-initiator component includes a photo-radical initiator and a photo-base generator (PBG); and the anaerobic-initiator component includes a metal reactive initiator, an accelerator, and an inhibitor.
• US8900795B2
  申请人：——

  公开号：US8900795B2

  公开（公告）日：2014-12-02