申请人:——
公开号:US20020020832A1
公开(公告)日:2002-02-21
Photosensitive compositions comprising
(A) an alkali soluble compound;
(B) at least one compound, of formula I or II
1
wherein
R
1
inter alia is C
4
-C
9
cycloalkanoyl, C
3
-C
12
alkenoyl, or benzoyl which is unsubstituted or substituted; Ar
1
is either C
6
-C
20
aryl or C
6
-C
20
aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M
1
when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR
3
, SR
4
or NR
5
R
6
; or M
1
, when x is 3, is a trivalent group, optionally substituted; R
3
is for example hydrogen or C
1
-C
12
alkyl; C
2
-C
6
alkyl which is for example substituted by —OH, —SH, —CN, C
3
-C
6
alkenoxy, or —OCH
2
CH
2
CN; R
4
is for example hydrogen, C
1
-C
12
alkyl, C
3
-C
12
alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R
5
and R
6
independently of each other inter alia are hydrogen, C
1
-C
12
alkyl, C
2
-C
4
hydroxyalkyl, C
2
-C
10
alkoxyalkyl, C
3
-C
5
alkenyl, C
3
-C
8
cycloalkyl, phenyl-C
1
-C
3
alkyl, C
1
-C
4
alkanoyl, C
3
-C
6
alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and
(C) a photopolymerizable compound;
exhibit an unexpectedly good performance, in particular in photoresist technology.
光敏感组合物包括(A)可溶于碱的化合物;(B)至少一种公式I或II1的化合物,其中R1包括C4-C9
环烷酰基,C3-C12
烯酰基或未取代或取代的
苯酰基; Ar1是未取代或取代的C6-C20芳基或C6-C20芳基酰基; x为2或3; 当x为2时,M1包括
苯基或
萘基,每个基都可以选项地被OR3,SR4或NR5R6取代; 当x为3时,M1是三价基团,可以选项地被取代; R3例如为
氢或C1-C12烷基; C2-C6烷基例如被-OH,-SH,-CN,C3-C6
烯氧基或-OCH2CH2CN取代; R4例如为
氢,C1-C12烷基,C3-C12
烯基,
环己基或未取代或取代的
苯基; R5和R6彼此独立地包括
氢,C1-C12烷基,C2-C4羟基烷基,C2-C10烷
氧基烷基,C3-C5
烯基,C3-C8
环烷基,
苯基-C1-C3烷基,C1-C4烷酰基,C3-C6
烯酰基,
苯酰基或未取代或取代的
苯基; 和(C)光聚合化合物;在光阻技术中表现出意外的良好性能。