申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP2463714A1
公开(公告)日:2012-06-13
A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.
一种化学放大抗蚀剂组合物由碱聚合物、酸发生器和胺淬灭剂组成,其形式为具有酸易变基团取代的羧基的β-丙氨酸、γ-氨基丁酸或 5-氨基戊酸衍生物,曝光前后的碱性溶解率对比度高,形成的图案轮廓清晰,分辨率高,粗糙度小,焦距宽。