2,4,6-tris(benzyloxycarbonyl)-1,3,5-triazine | 344758-66-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 2,4,6-tris(benzyloxycarbonyl)-1,3,5-triazine
• 英文别名: Tribenzyl 1,3,5-triazine-2,4,6-tricarboxylate
• CAS: 344758-66-3
• 化学式: C₂₇H₂₁N₃O₆
• 分子量: 483.48
• InChiKey: UYMUZJNTGYFYLY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5
• 重原子数：
  36
• 可旋转键数：
  12
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  118
• 氢给体数：
  0
• 氢受体数：
  9

反应信息

• 作为反应物：
  描述：

  2,4,6-tris(benzyloxycarbonyl)-1,3,5-triazine 、 1-苄基-1H-吲哚-3-胺盐酸盐 以 N,N-二甲基甲酰胺 为溶剂， 反应 8.0h， 以92%的产率得到dibenzyl 5-benzylpyrimido[5,4-b]indole-2,4-dicarboxylate
  参考文献：
  名称：

  Total Synthesis of 4-Azaeudistomin Y1 and Analogues by Inverse-Electron­Demand Diels-Alder Reactions of 3-Aminoindoles with 1,3,5-Triazines

  摘要：

  A new inverse-electron-demand Diels-Alder (IDA) reaction of 3-aminoindoles as dienophiles was developed for the efficient preparation of 4-aza-beta-carbolines in high yields. Because N-1-unprotected 3-aminoindoles show poor thermal stability, a one-pot protocol was developed that combines the removal of tert-butoxycarbonyl protecting groups with the IDA reaction. This protocol, using tert-butyl 1H-indol-3-ylcarbamates as reactants, gave the corresponding IDA products in excellent yields. The new IDA methodology was used in a total synthesis of 4-azaeudistomin Y-1, which was obtained in 57% overall yield in four steps. Moreover, the chemistry is suitable for the rapid preparation, through either Friedel-Crafts acylation or amide-formation reactions, of analogues that are useful for exploring structure-activity relationships at the C-1-position.

  DOI：

  10.1055/s-0032-1316857
• 作为产物：
  描述：

  1,3,5-triazine-2,4,6-tricarbonyl trichloride 、 苯甲醇 在 三乙胺 作用下， 以 乙醚 为溶剂， 反应 3.0h， 生成 2,4,6-tris(benzyloxycarbonyl)-1,3,5-triazine
  参考文献：
  名称：

  缺电子 1,3,5-三嗪作为潜在的氮杂二烯用于逆电子需求 Diels-Alder 反应的合成

  摘要：

  制备了各种具有吸电子基团的 1,3,5-三嗪，如酯、硫酯和酰胺。这些三嗪是使用酰氯偶联方法由三嗪 1a 和各种醇、乙硫醇和胺合成的。确定了这些 1,3,5-三嗪的最低未占分子轨道 (LUMO) 能量和溶解度，以评估它们在逆电子需求 Diels-Alder 反应 (IDA) 中作为氮杂二烯的潜力。与三嗪 1 相比，硫酯 8 显示出更低的 LUMO 能量和更高的溶解度，这表明它可能是研究三嗪 IDA 反应的更好的氮杂二烯。

  DOI：

  10.1080/00397910902978031

文献信息

• COMPOUNDS HAVING A STABILIZING EFFECT, METHOD FOR PRODUCING SAID COMPOUNDS, COMPOSITION CONTAINING SAID STABILIZING COMPOUNDS, METHOD FOR STABILIZING AN ORGANIC COMPONENT, AND USE OF STABILIZING COMPOUNDS
  申请人：FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E. V.

  公开号：US20200361879A1

  公开（公告）日：2020-11-19

  The invention relates to compounds of a new type which have a stabilizing effect and in particular provide stabilization with respect to oxidative thermal and/or actinic decomposition of or damage to organic materials. The compounds are represented by general formula I specified below. The invention further relates to a method for producing such compounds, to compositions containing said compound, to a method for stabilizing organic compounds by means of the stabilizing compounds, and to the use of the stabilizing compounds to stabilize organic materials.

  该发明涉及一种新型化合物，具有稳定作用，特别是在有机材料受氧化热解和/或光化学分解或损伤方面提供稳定作用。该化合物由下面指定的一般式I表示。该发明还涉及一种制备这种化合物的方法，含有该化合物的组合物，通过稳定化合物稳定有机化合物的方法，以及使用稳定化合物稳定有机材料的用途。
• Macromolecular antioxidants based on dual type moiety per molecule: structures, methods of making and using the same
  申请人：Polnox Corporation

  公开号：US10294423B2

  公开（公告）日：2019-05-21

  Disclosed are compounds represented by structural formula (I), methods of producing compounds represented by structural formula, and their use in inhibiting oxidation in an oxidizable material.

  本发明公开了结构式（I）所代表的化合物、生产结构式所代表的化合物的方法，以及它们在抑制可氧化材料氧化中的用途。
• Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound
  申请人：JSR CORPORATION

  公开号：US11003079B2

  公开（公告）日：2021-05-11

  The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R1 to R4 bond. Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

  用于成膜的组合物包括一种包括式（1）基团的化合物和一种溶剂。在式 (1) 中，R1 至 R4 各自独立地代表氢原子、具有 1 至 20 个碳原子的一价有机基团，或 R1 至 R4 合在一起代表具有 3 至 20 个环原子的环状结构以及 R1 至 R4 所键合的碳原子或碳链。Ar1 代表通过从具有 6 至 20 个碳原子的芳香环中移除 (n+3) 个氢原子而得到的基团，n 为 0 至 9 的整数。R5 代表羟基、卤素原子、硝基或具有 1 至 20 个碳原子的一价有机基团。
• Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate
  申请人：JSR CORPORATION

  公开号：US11215928B2

  公开（公告）日：2022-01-04

  A composition for resist underlayer film formation contains: a first compound including at least one oxazine structure fused to an aromatic ring; and a solvent. The first compound preferably includes a partial structure represented by formula (1). In formula (1), R2 to R5 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; Ar1 represents a group obtained by removing (n+3) or (n+2) hydrogen atoms on the aromatic ring from an arene having 6 to 20 carbon atoms; R6 represents a hydroxy group, a halogen atom, a nitro group or a monovalent organic group having 1 to 20 carbon atoms; and n is an integer of 0 to 9.

  一种用于形成抗蚀剂底层薄膜的组合物含有：第一种化合物，其中包括至少一种与芳香环融合的噁嗪结构；以及一种溶剂。第一种化合物最好包括由式（1）表示的部分结构。在式 (1) 中，R2 至 R5 各自独立地代表氢原子或具有 1 至 20 个碳原子的一价有机基团；Ar1 代表通过从具有 6 至 20 个碳原子的芳香环上除去 (n+3) 或 (n+2) 个氢原子而得到的基团；R6 代表羟基、卤素原子、硝基或具有 1 至 20 个碳原子的一价有机基团；以及 n 是 0 至 9 的整数。
• ALEKSEEVA, N. V.;MASTAFANOVA, L. I.;YAXONTOV, L. N., XIMIYA GETEROTSIKL. SOEDIN., 1983, N 5, 702-705
  作者：ALEKSEEVA, N. V.、MASTAFANOVA, L. I.、YAXONTOV, L. N.

  DOI：——

  日期：——