申请人:FMC Corporation
公开号:US05167691A1
公开(公告)日:1992-12-01
This application discloses herbicidal 1-aryl-pyrazoles, compositions containing them, methods of preparing them, and methods for controlling undesired plant growth by preemergent or postemergent application of the herbicidal compositions to the locus where control is desired. The herbicidal compounds have the following generic structure: ##STR1## in which Ar is ##STR2## R is chlorine, cyano, or nitro; R.sup.1 is a group --C(O)CR.sup.11 R.sup.12 --O--R.sup.13 in which R.sup.11 and R.sup.12 are independently hydrogen or alkyl; R.sup.13 is hydrogen, alkylcarbonyl, phenylcarbonyl, phenylmethyl, or alkylaminosulfonyl; R.sup.2 is hydrogen, alkyl, alkylcarbonyl, alkoxycarbonyl, or a group --C(O)CR.sup.11 R.sup.12 --O--R.sup.13 ; R.sup.3, R.sup.4, R.sup.6, R.sup.7 are independently hydrogen or halogen; R.sup.5 is halogen or haloalkyl; R.sup.8 is halogen; R.sup.9 is haloalkyl; R.sup.10 is hydrogen, halogen, or a group --NR.sup.14 R.sup.15 in which R.sup.14 is hydrogen or alkyl; R.sub.15 is alkyl, alkynyl, or a group --CHR.sup.16 --Ar.sup.1 in which R.sup.16 is hydrogen or alkyl; and Ar.sup.1 is tetrahydrofuran-2-yl; furan-2-yl, thien-2-yl, phenyl, or phenyl substituted with halogen or alkoxy. When R.sup.10 is a group --NR.sup.14 R.sup.15, in addition to the substituents listed above, R.sup.1 may be alkylcarbonyl, haloalkylcarbonyl, or cycloalkylcarbonyl; and R.sup.2 may be hydrogen, alkylcarbonyl, or cycloalkylcarbonyl.
该应用程序披露了除草的1-芳基吡唑,包含它们的组合物,制备它们的方法,以及通过预出苗或出苗后在需要控制的地点施用除草组合物来控制不良植物生长的方法。除草化合物具有以下通用结构:##STR1## 其中Ar为##STR2## R为氯,氰或硝基;R.sup.1为--C(O)CR.sup.11R.sup.12--O--R.sup.13的基团,其中R.sup.11和R.sup.12独立地为氢或烷基;R.sup.13为氢,烷基羰基,苯基羰基,苯甲基或烷基氨基磺酰;R.sup.2为氢,烷基,烷基羰基,烷氧基羰基,或--C(O)CR.sup.11R.sup.12--O--R.sup.13的基团;R.sup.3,R.sup.4,R.sup.6,R.sup.7独立地为氢或卤素;R.sup.5为卤素或卤代烷基;R.sup.8为卤素;R.sup.9为卤代烷基;R.sup.10为氢,卤素,或--NR.sup.14R.sup.15的基团,其中R.sup.14为氢或烷基;R.sub.15为烷基,炔基,或--CHR.sup.16--Ar.sup.1的基团,其中R.sup.16为氢或烷基;Ar.sup.1为四氢呋喃-2-基,呋喃-2-基,噻吩-2-基,苯基,或被卤素或烷氧基取代的苯基。当R.sup.10为--NR.sup.14R.sup.15的基团时,除上述取代基外,R.sup.1可以是烷基羰基,卤代烷基羰基,或环烷基羰基;R.sup.2可以是氢,烷基羰基,或环烷基羰基。