1,3-双(2',4'-双(缩水甘油醚基)苯基)金刚烷 | 945027-90-7

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 中文名称: 1,3-双(2',4'-双(缩水甘油醚基)苯基)金刚烷
• 英文名称: 1,3-bis(2,4-diglycidyloxyphenyl)adamantane
• 英文别名: 2-[[2-[3-[2,4-Bis(oxiran-2-ylmethoxy)phenyl]-1-adamantyl]-5-(oxiran-2-ylmethoxy)phenoxy]methyl]oxirane
• CAS: 945027-90-7
• 化学式: C₃₄H₄₀O₈
• 分子量: 576.687
• InChiKey: UCPVZNPDHRPCDP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.5
• 重原子数：
  42
• 可旋转键数：
  14
• 环数：
  10.0
• sp3杂化的碳原子比例：
  0.65
• 拓扑面积：
  87
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  1,3-bis(2,4-dihydroxyphenyl)adamantane 、 环氧氯丙烷 在 sodium hydroxide 作用下， 以 二甲基亚砜 、 丁酮 为溶剂， 生成 1,3-双(2',4'-双(缩水甘油醚基)苯基)金刚烷
  参考文献：
  名称：

  ADAMANTYL GROUP-CONTAINING EPOXY-MODIFIED (METH)ACRYLATE AND RESIN COMPOSITION CONTAINING THE SAME

  摘要：

  本发明提供了一种含有金刚烷基的环氧改性（甲基）丙烯酸酯及其树脂组合物，具有透明度、光学特性（耐久性）和热稳定性等优良机械性能。例如，它们是具有以下一般式（I）的含有金刚烷基的环氧改性（甲基）丙烯酸酯及其组合物。在该式中，R1代表氢原子或甲基基团，R2代表卤素原子或可能包含杂原子的脂肪烃基团。复数的R2可能相同或不同，m表示0到4的整数，n表示0或更多的整数。

  公开号：

  US20090099330A1

文献信息

• ADAMANTANE DERIVATIVE, RESIN COMPOSITION CONTAINING SAME, AND OPTOELECTRONIC MEMBER AND SEALING AGENT FOR ELECTRONIC CIRCUIT USING THOSE
  申请人：Idemitsu Kosan Co., Ltd.

  公开号：EP1985616A1

  公开（公告）日：2008-10-29

  Disclosed is an adamantane derivative which provides a cured product excellent in optical characteristics such as transparency and light resistance, long-term heat resistance, electrical characteristics such as and dielectric constant, and low water absorption. Also disclosed are a resin composition containing the adamantane derivative, a sealing agent for electronic circuits, optical electronic member, semiconductor device and copper-clad laminate all using the resin composition, and a radiation-sensitive resin composition which contains the above-mentioned adamantane derivative as a crosslinking agent. Specifically disclosed are an adamantane derivative represented by the formula (I-1) below, a resin composition containing the adamantane derivative, a sealing agent for electronic circuits, optical electronic member, semiconductor device and copper-clad laminate, all using the resin composition, and a radiation-sensitive resin composition which contains the above-mentioned adamantane derivative as a crosslinking agent.

  本发明涉及一种金刚烷衍生物，其提供了在光学特性（如透明度和耐光性）、长期耐热性、电学特性（如介电常数）和低吸水性等方面表现出色的固化产物。本发明还涉及一种含有金刚烷衍生物的树脂组合物，以及使用该树脂组合物的电子电路密封剂、光电子元件、半导体器件和铜覆盖层层压板，以及一种辐射敏感的树脂组合物，其中包含上述金刚烷衍生物作为交联剂。具体公开了以下公式（I-1）所表示的金刚烷衍生物，以及含有该金刚烷衍生物的树脂组合物、电子电路密封剂、光电子元件、半导体器件和铜覆盖层层压板，以及含有上述金刚烷衍生物作为交联剂的辐射敏感的树脂组合物。
• FILTRATION FILTER, FILTRATION METHOD, PRODUCTION METHOD OF PURIFIED LIQUID CHEMICAL PRODUCT FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：EP3159057A2

  公开（公告）日：2017-04-26

  A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.

  一种用于过滤光刻用液体化学品的过滤过滤器，配有聚酰亚胺树脂多孔膜；一种过滤方法，包括允许光刻用液体化学品通过过滤过滤器；以及一种光刻用纯化液体化学品的生产方法，包括通过过滤方法过滤光刻用液体化学品。
• Filtration filter, filtration method, production method of purified liquid chemical product for lithography, and method of forming resist pattern
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10429738B2

  公开（公告）日：2019-10-01

  A filtration filter used for filtering a liquid chemical for lithography, provided with a polyimide resin porous membrane; a filtration method including allowing a liquid chemical for lithography to pass through the filtration filter; and a production method of a purified liquid chemical product for lithography, including filtering a liquid chemical for lithography by the filtration method.

  一种用于过滤光刻用液体化学品的过滤过滤器，配有聚酰亚胺树脂多孔膜；一种过滤方法，包括允许光刻用液体化学品通过过滤过滤器；以及一种光刻用纯化液体化学品的生产方法，包括通过过滤方法过滤光刻用液体化学品。
• NONPOLYMERIC ANTIREFLECTION COMPOSITIONS CONTAINING ADAMANTYL GROUPS
  申请人：Brewer Science, Inc.

  公开号：EP2805347A1

  公开（公告）日：2014-11-26
• FILTERING MATERIAL, FILTRATION FILTER, AND FILTRATION METHOD
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20170051084A1

  公开（公告）日：2017-02-23

  A filtering material which is used to filter a liquid chemical for lithography, in which a base material having a group represented by the following Formula (a0-1) is used: (*-Ya 01  n W  (a0-1) in which Ya 01 represents a divalent linking group; W represents a heteroatom-containing group, here, the group represented by W includes a nitrogen atom bonded to Ya 01 and two or more heteroatoms other than the nitrogen atom bonded to Ya 01 ; n represents a natural number; and * represents a valence bond with respect to the base material.