There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1):
wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.
本发明提供了一种具有耐热性的抗蚀剂底层薄膜,可用于半导体设备生产中的光刻工艺,以及一种具有透明度的高折射率薄膜,可用于电子设备。一种包含式(1)单元结构的聚合物:
其中 R1、R2、R3 和 R5 各可为氢原子,R4 可为苯基或
萘基。一种抗蚀剂底层薄膜形成组合物,包含该聚合物,以及由该组合物形成的抗蚀剂底层薄膜。一种高折射率薄膜形成组合物,包括该聚合物,以及由该组合物形成的高折射率薄膜。