Process for image-wise modifying the surface of an etchable support and material suitable therefor comprising a colloid layer containing polymers with oxime-ester groups
申请人:AGFA-GEVAERT
naamloze vennootschap
公开号:EP0000082A1
公开(公告)日:1978-12-20
A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation of the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon imagewise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.
Process for stretching a swollen flexible-chain polymer
申请人:DSM N.V.
公开号:EP0530909A1
公开(公告)日:1993-03-10
Process for stretching an article substantially consisting of a flexible-chain polymer, which is swollen in a solvent for that polymer, in which process an article substantially consisting of a copolymer of the polymer with a second polymer is swollen in a selective solvent for the flexible-chain polymer, and stretched, and an article containing an oriented flexible-chain polymer with a dichroic ratio of at least 1.1.