The present invention relates to impurities of donepezil, or a pharmaceutically acceptable salt thereof, which may be produced during synthesis and storage of donepezil, or a pharmaceutically-acceptable salt thereof, and to methods of identifying such impurities. The invention also relates to the use of these impurities in analytical techniques and to product that contain certain low levels of these impurities in particular the following impurities are disclosed: formula (I) and formula (II).
本发明涉及
多奈哌齐的杂质或其药学上可接受的盐,在
多奈哌齐或其药学上可接受的盐的合成和储存过程中可能产生,以及识别这些杂质的方法。本发明还涉及在分析技术中使用这些杂质以及包含特定低
水平这些杂质的产品,特别是披露以下杂质:式(I)和式(II)。