The present invention provides a novel hexaarylbiimidazole compound of the following formula (1): wherein each R1 represents a halogen, and each R2 represents an optionally substituted C1-4 alkyl group. The hexaarylbiimidazole compound of the present invention is useful as photoradical generators in photopolymerizable compositions used as resists and is characterized by low sublimating thermal decomposition products. The photopolymerizable compositions may be suitably used as resists or as color filters for color liquid crystal display elements, cameras and the like.
本发明提供了一种新型的六芳基联
双咪唑化合物,其
化学式为(1),其中每个R1代表卤素,每个R2代表可选取代的C1-4烷基基团。本发明的六芳基联
双咪唑化合物可用作光致自由基发生剂,用于光聚合组合物中作为抗蚀剂,并具有低升华热分解产物的特点。光聚合组合物可适当地用作抗蚀剂或彩色液晶显示元件、相机等的彩色滤光片。