[EN] KRAS G12C INHIBITORS<br/>[FR] INHIBITEURS DE KRAS G12C
申请人:MIRATI THERAPEUTICS INC
公开号:WO2017201161A1
公开(公告)日:2017-11-23
The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.
The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.
[EN] SMALL MOLECULE INHIBITORS OF KRAS G12D MUTANT<br/>[FR] INHIBITEURS À PETITES MOLÉCULES DE MUTANT DE KRAS G12D
申请人:MERCK SHARP & DOHME
公开号:WO2022221739A1
公开(公告)日:2022-10-20
Compounds or their pharmaceutically acceptable salts can inhibit the G12D mutant of Kirsten rat sarcoma (KRAS) protein and are expected to have utility as therapeutic agents, for example, for treating cancer. The disclosure also provides pharmaceutical compositions which comprise compounds disclosed herein or pharmaceutically acceptable salts thereof. The disclosure also relates to methods for use of the compounds or their pharmaceutically acceptable salts in the therapy and prophylaxis of cancer and for preparing pharmaceuticals for this purpose.
Modified polyepoxy compound, process for producing the compound, and epoxy resin composition
申请人:SHELL INTERNATIONALE RESEARCH
MAATSCHAPPIJ B.V.
公开号:EP0661322A2
公开(公告)日:1995-07-05
A modified polyepoxy compound obtained by etherifying a secondary hydroxyl group of a polyepoxy compound having an alcoholic secondary hydroxyl group, such as a polyepoxy compound obtained by reaction of a bifunctional phenol compound and an epihalohydrin, or a polyepoxy compound obtained by reaction of a bifunctional phenol type epoxy compound and a bifunctional phenol compound, and an epoxy resin composition using the modified polyepoxy compound as the epoxy resin. Further, a modified brominated polyepoxy compound obtained by etherifying a secondary hydroxyl group of a polyepoxy compound having an alcoholic secondary hydroxyl group obtained by reaction of a polyepoxy compound which does not substantially contain a halogen atom and a polyhydric phenol compound having at least one bromine atom directly bonded to an aromatic ring per one molecule, and an epoxy resin composition for semiconductor encapsulation having blended therewith the modified brominated polyepoxy compound as the flame retardant.
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS
申请人:Shin-Etsu Chemical Co., Ltd.
公开号:EP3508918A1
公开(公告)日:2019-07-10
The invention provides: a composition for forming an organic film, the composition having high filterability and enabling formation of an organic film which has high pattern-curving resistance, and which prevents a high-aspect line pattern particularly finer than 40 nm from line collapse and twisting after dry etching; a method for forming an organic film and a patterning process which use the composition; and a substrate for manufacturing a semiconductor device, including the organic film formed on the substrate. The composition for forming an organic film includes a condensate (A), which is a condensation product of dihydroxynaphthalene shown by the following formula (1) and a condensation agent, or a derivative of the condensate (A). A sulfur content among constituent elements contained in the condensate (A) or the derivative of the condensate (A) is 100 ppm or less in terms of mass.