A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
本发明提供了一种具有外型 2-烷基双环[2.2.1]庚-2-基团作为保护基团的新型
酯类化合物,以及一种包含该
酯类化合物单元的聚合物。该聚合物可用作基础
树脂,配制出一种光刻胶组合物,与传统光刻胶组合物相比,具有更高的灵敏度、分辨率和抗蚀刻性。