Novel ester compounds, polymers, resist compositions and patterning process
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:EP1031879A1
公开(公告)日:2000-08-30
A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.