2-Methyl-1-adamantancarbonsaeure | 32406-79-4

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-Methyl-1-adamantancarbonsaeure
• 英文别名: 2-Methyl-adamantan-1-carbonsaeure；2-Methyladamantankarbonsaeure-3；2-Methyladamantankarbonsaeure-1；2-Methyladamantancarbonsaeure-(1)；2-Methyladamantane-1-carboxylic acid
• CAS: 32406-79-4
• 化学式: C₁₂H₁₈O₂
• 分子量: 194.274
• InChiKey: IZBNQJCHUQYWLS-UHFFFAOYSA-N

物化性质

• 沸点：
  307.0±10.0 °C(Predicted)
• 密度：
  1.167±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.8
• 重原子数：
  14
• 可旋转键数：
  1
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  2-Methyl-1-adamantancarbonsaeure 在 lithium aluminium tetrahydride 、 二溴亚砜 作用下， 以 乙醚 为溶剂， 生成 1-Brommethyl-2-methyladamantan
  参考文献：
  名称：

  Landa,S.; Hlavaty,J., Collection of Czechoslovak Chemical Communications, 1971, vol. 36, p. 3059 - 3065

  摘要：

  DOI：
• 作为产物：
  描述：

  甲酸 、 2-甲基-1-金刚烷醇 在 硫酸 作用下， 生成 2-Methyl-1-adamantancarbonsaeure
  参考文献：
  名称：

  Landa,S.; Hlavaty,J., Collection of Czechoslovak Chemical Communications, 1971, vol. 36, p. 3059 - 3065

  摘要：

  DOI：

文献信息

• Koch–Haaf reaction of adamantanols in an acid-tolerant hastelloy-made microreactor
  作者：Takahide Fukuyama、Yu Mukai、Ilhyong Ryu

  DOI：10.3762/bjoc.7.149

  日期：——

  The Koch–Haaf reaction of adamantanols was successfully carried out in a microflow system at room temperature. By combining an acid-tolerant hastelloy-made micromixer, a PTFE tube, and a hastelloy-made microextraction unit, a packaged reaction-to-workup system was developed. By means of the present system, the multigram scale synthesis of 1-adamantanecarboxylic acid was achieved in ca. one hour operation.

  亚当antanols的Koch-Haaf反应在室温下成功地在微流系统中进行。通过结合耐酸的哈氏合金微型混合器、PTFE管和哈氏合金微型萃取装置，开发了一种包装的反应到工作流程系统。通过使用该系统，约1小时的操作时间内实现了1-亚当antanecarboxylic酸的多克制备。
• RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD, AND SEMICONDUCTOR DEVICE
  申请人：MITSUBISHI GAS CHEMICAL COMPANY, INC.

  公开号：EP3916025A1

  公开（公告）日：2021-12-01

  The resin composition of the present invention is a resin composition containing: a bismaleimide compound (A) containing a constituent unit represented by the following formula (1) and maleimide groups at both ends of the molecular chain; a compound (B) containing one or more carboxy groups; and a photo initiator (C). In the formula (1), R1 represents a linear or branched alkylene group having 1 to 16 carbon atoms, or a linear or branched alkenylene group having 2 to 16 carbon atoms. R2 represents a linear or branched alkylene group having 1 to 16 carbon atoms, or a linear or branched alkenylene group having 2 to 16 carbon atoms. Each R3 independently represents a hydrogen atom, a linear or branched alkyl group having 1 to 16 carbon atoms, or a linear or branched alkenyl group having 2 to 16 carbon atoms. Each n independently represents an integer of 1 to 10.

  本发明的树脂组合物是一种含有以下成分的树脂组合物：双马来酰亚胺化合物（A），其组成单元由下式（1）表示，分子链两端含有马来酰亚胺基团；化合物（B），含有一个或多个羧基；以及光引发剂（C）。 在式 (1) 中，R1 代表具有 1 至 16 个碳原子的直链或支链亚烷基，或具有 2 至 16 个碳原子的直链或支链烯基。R2 代表具有 1 至 16 个碳原子的直链或支链亚烷基，或具有 2 至 16 个碳原子的直链或支链烯基。每个 R3 独立地代表氢原子、具有 1 至 16 个碳原子的直链或支链烷基或具有 2 至 16 个碳原子的直链或支链烯基。每个 n 独立地代表 1 至 10 的整数。
• HIGH ETCH RESISTANT UNDERLAYER COMPOSITIONS FOR MULTILAYER LITHOGRAPHIC PROCESSES
  申请人：De Binod B.

  公开号：US20080206667A1

  公开（公告）日：2008-08-28

  An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.
• THERMALLY CURED UNDERLAYER FOR LITHOGRAPHIC APPLICATION
  申请人：De Binod B.

  公开号：US20120178871A1

  公开（公告）日：2012-07-12

  An etch resistant thermally curable Underlayer composition for use in a multiplayer lithographic process for producing a photolithographic bilayer coated substrate, the composirion being a composition of: (a) a polymer comprising repeating units of Structure I, II and III (b) at least one crosslinking agent; (c) at least one thermal acid generator; and (d) at least one solvent.
• METHOD FOR THE DIFFERENTIATION OF ALTERNATIVE SOURCES OF NAPHTHENIC ACIDS
  申请人：ROWLAND Steven J.

  公开号：US20120318969A1

  公开（公告）日：2012-12-20

  A method for determining naphthenic acids derived from different sources, in particular oil sands process water by identifying particular tricyclic and pentacyclic diamondoid acids in a sample and measuring the concentration of the acids to provide a distinctive profile for a given source.