citric acid tris-(hydroxymethyl-amide) | 32449-14-2

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: citric acid tris-(hydroxymethyl-amide)
• 英文别名: Citronensaeure-tris-(hydroxymethyl-amid)；2-hydroxy-1-N,2-N,3-N-tris(hydroxymethyl)propane-1,2,3-tricarboxamide
• CAS: 32449-14-2
• 化学式: C₉H₁₇N₃O₇
• 分子量: 279.25
• InChiKey: SRHHIJAUOSPPFD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -4.5
• 重原子数：
  19
• 可旋转键数：
  8
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  168
• 氢给体数：
  7
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  聚合甲醛 、 檸檬醯胺 在 barium dihydroxide 、 水 作用下， 生成 citric acid tris-(hydroxymethyl-amide)
  参考文献：
  名称：

  Einhorn; Feibelmann, Justus Liebigs Annalen der Chemie, 1908, vol. 361, p. 143

  摘要：

  DOI：

文献信息

• [EN] HYDRATE INHIBITORS<br/>[FR] INHIBITEURS D'HYDRATES
  申请人：M I SWACO NORGE AS

  公开号：WO2010101477A1

  公开（公告）日：2010-09-10

  The present invention relates to compounds for controlling gas hydrate formation of the formula (I) and (II) and plugging of gas hydrate forming fluids wherein R1 is selected from the group consisting of H, acetyl and carbonyl derivative; R2 is H, -OR3 or -NR4R5, where: R3 is H, C1-6-alkyl or carbonyl derivative, R4, R5 are selected from the group consisting of H, C1-18-alkyl, alkanol, alkoxy, cyclic/aromatic or alkylene. The invention further comprises compositions and method of producing the compounds of formula (I) and (II), method for controlling gas hydrate formation and plugging of gas hydrate forming fluids, and use of compounds of formula (I) and (II).

  本发明涉及用于控制气体水合物形成的化合物的公式(I)和(II)，以及封堵气体水合物形成流体的化合物，其中R1从H、乙酰和羰基衍生物组成的群体中选择；R2为H、-OR3或-NR4R5，其中：R3为H、C1-6-烷基或羰基衍生物，R4、R5从H、C1-18-烷基、烷醇、烷氧基、环/芳香族或烷基组成的群体中选择。该发明还包括制备公式(I)和(II)化合物的组合物和方法，控制气体水合物形成和封堵气体水合物形成流体的方法，以及使用公式(I)和(II)化合物的方法。
• Halo resistent, photoimagable coverlay compositions, having, advantageous application and removal properties, and methods relating thereto
  申请人：——

  公开号：US20040058276A1

  公开（公告）日：2004-03-25

  A flexible, aqueous processible, photoimagable coverlay compositions, having advantageous adhesion and release properties and resistance to (unwanted) haloing. The coverlay compositions of the present invention comprise an acrylic, low Tg, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties. Optionally, the coverlay further comprises a thiophene-type adhesion promoter to further improve adhesion properties.

  一种灵活、水溶性、光敏覆盖层组合物，具有优异的粘附和释放性能以及抗（不需要的）晕影性能。本发明的覆盖层组合物包括具有耐碱骨架段和含亲水性基团的悬臂臂段的丙烯酸低Tg嫁接共聚物粘合剂组分。可选地，覆盖层进一步包括一种噻吩型粘附促进剂，以进一步改善粘附性能。
• Solvent dispersible interpenetrating polymer networks
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP0501433A1

  公开（公告）日：1992-09-02

  A novel class of interpenetrating polymer networks which are dispersible in conventional coating solvents is disclosed. Such dispersions are useful in preparing protective and/or decorative film coatings and are particularly useful in photosensitive or imaging formulations such as photoresists, solder masks and the like. These polymer networks are comprised of at least two interpenetrating crosslinked polymers. At least one of the polymer networks is formed by polymerization in a solvent. In one embodiment of this invention, at least one polymer network is prepared from macromers to produce a polymer system having functionalized branch or graft linear segments. The solvent dispersible interpenetrating networks of this invention are particularly useful as binders in addition polymerizable photosensitive compositions containing crosslinking monomers such as solder masks. Upon exposure to actinic radiation and suitable thermal curing, solder mask coatings of such photosensitive compositions form multiple, e.g., triple, interpenetrating polymer networks having superior toughness and flexibility.

  本发明公开了一类可在传统涂料溶剂中分散的新型互穿聚合物网络。这类分散体可用于制备保护性和/或装饰性薄膜涂层，尤其适用于感光或成像配方，如光刻胶、阻焊层等。这些聚合物网络由至少两种互穿交联聚合物组成。其中至少一种聚合物网络是在溶剂中聚合形成的。在本发明的一个实施方案中，至少有一种聚合物网络是由大分子聚合物制备而成的，以产生具有官能化分支或接枝线性段的聚合物体系。本发明的溶剂可分散互穿网络在含有交联单体的可聚合光敏组合物（如焊接掩模）中用作粘合剂特别有用。在暴露于光辐射和适当的热固化后，这种光敏组合物的焊料掩模涂层会形成多重（如三重）互穿聚合物网络，具有优异的韧性和柔韧性。
• Halo resistant photoimagable coverlay compositions
  申请人：E.I. DU PONT DE NEMOURS AND COMPANY

  公开号：EP1400545A2

  公开（公告）日：2004-03-24

  The invention relates to flexible, aqueous processible, photoimagable coverlay compositions, having advantageous adhesion and release properties and resistance to (unwanted) haloing. The coverlay compositions of the present invention comprise an acrylic, low Tg, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties. Optionally, the coverlay further comprises a thiophene-type adhesion promoter to further improve adhesion properties.

  本发明涉及柔性的、可水溶液加工的、可感光的覆盖层组合物，该组合物具有良好的粘附性、释放性和抗（不需要的）晕染性。本发明的覆盖层组合物包括丙烯酸低 Tg 接枝共聚物粘合剂组分，该组分具有耐碱骨架段和由亲水分子组成的垂臂段。可选地，覆盖层还包括噻吩类附着力促进剂，以进一步改善附着力特性。
• Halo resistent, photoimagable coverlay compositions, having advantageous application and removal properties, and methods relating thereto
  申请人：Dueber E. Thomas

  公开号：US20050079442A1

  公开（公告）日：2005-04-14

  A flexible, aqueous processible, photoimagable coverlay compositions, having advantageous adhesion and release properties and resistance to (unwanted) haloing. The coverlay compositions of the present invention comprise an acrylic, low Tg, graft copolymer binder component, having an alkali resistant backbone-segment and a pendant arm segment comprising hydrophilic moieties. Optionally, the coverlay further comprises a thiophene-type adhesion promoter to further improve adhesion properties.

  一种柔性的、水溶液可加工的、可照相成像的覆盖层组合物，具有良好的粘附性、释放性和抗（不需要的）光晕性。本发明的覆盖层组合物包括丙烯酸低 Tg 接枝共聚物粘合剂成分，该粘合剂具有耐碱的主干段和由亲水性分子组成的垂臂段。可选地，覆盖层还包括噻吩类附着力促进剂，以进一步改善附着力特性。