The present invention provides methods of designing molecularly imprinted polymers (MIPs) which have applications in extracting bioactive compounds from a range of bioprocessing feedstocks and wastes. The present invention is further directed to MIPs designed by the methods of the present invention.
Multifunctional phosphated polyphenols, thermoplastics, and thermosetting resins
申请人:The United States of America, as Represented by the Secretary of the Navy
公开号:US10669400B1
公开(公告)日:2020-06-02
A method for preparing fire resistant polymeric materials including, providing at least one first polyphenol having three or more phenolic groups, reacting at least one first polyphenol having three or more phenolic groups with at least one halophosphate and at least one first base to produce at least one second phenol having at least one phosphate group, and converting at least one second phenol having at least one phosphate group to a thermoplastic or thermosetting fire resistant polymeric material.
Synthesis and protein-tyrosine kinase inhibitory activity of polyhydroxylated stilbene analogs of piceatannol
作者:Kshitij Thakkar、Robert L. Geahlen、Mark Cushman
DOI:10.1021/jm00072a015
日期:1993.10
A series of hydroxylated trans-stilbenes related to the antileukemic natural product trans-3,3',4,5'-tetrahydroxystilbene (piceatannol) (1) has been prepared and tested for inhibition of the lymphoid cell lineage-specific protein-tyrosine kinase p56lck, which plays an important role in lymphocyte proliferation and immune function. A number of the analogues displayed enhanced enzyme inhibitory activity relative to the natural product. Reduction of the double bond bridging the two aromatic rings and benzylation of the phenolic hydroxyl groups was found to decrease activity significantly. The most potent compounds in the series proved to be trans-3,3',5,5'-tetrahydroxystilbene, trans-3,3',5-trihydroxystilbene, and trans-3,4,4'-trihydroxystilbene.
RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME
申请人:NISSAN CHEMICAL INDUSTRIES, LTD.
公开号:US20150248057A1
公开(公告)日:2015-09-03
A resist overlayer film forming composition that is used for a lithography process for manufacturing semiconductor devices, and selectively transmits EUV only, in particular, by blocking exposure light undesirable for EUV exposure, such as UV and DUV, without intermixing with a resist, and that can be developed with a developing solution after exposure. A resist overlayer film forming composition including: a hydroxyl group-containing novolac-based polymer containing a structure of (Formula 1-1):
(in (Formula 1-1), Ar
1
is a divalent organic group that contains 1 to 3 benzene ring(s) and optionally contains a hydroxy group; Ar
2
is a benzene ring group, a naphthalene ring group, or an anthracene ring group; each of the hydroxy group and R
1
is a substituent for a hydrogen atom on a ring of Ar
2
); and a solvent.