申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US05922711A1
公开(公告)日:1999-07-13
A compound of the formula: ##STR1## wherein --X.sup.3 .dbd.X.sup.2 --X.sup.1 .dbd.N-- is a group of the formula: ##STR2## R.sup.1 is hydrogen or halogen, R.sup.2 is halogen, R.sup.3 is hydrogen, nitro, amino optionally having at least one substituent or a heterocyclic group optionally having at least one substituent, R.sup.4 and R.sup.5 are each hydrogen, or halogen, R.sup.6 and R.sup.8 are each hydrogen, halogen, lower alkyl, hydroxy, lower alkylthio, amino optionally substituted with lower alkyl, or lower alkoxy optionally substituted with a substituent selected from the group consisting of hydroxy, lower alkoxy, amino, lower alkylamino and aryl optionally substituted with lower alkoxy, R.sup.7 is hydrogen or lower alkyl, A is lower alkylene, and Q is O or N--R.sup.9 is hydrogen or acyl, provided that R.sup.3 is not hydrogen when X.sup.1 is C--R.sup.6, in which R.sup.6 is hydrogen, and pharmaceutically acceptable salts thereof.
化合物的结构式为:##STR1## 其中--X.sup.3 .dbd.X.sup.2 --X.sup.1 .dbd.N--是以下结构的基团:##STR2## R.sup.1为氢或卤素,R.sup.2为卤素,R.sup.3为氢、硝基、氨基(可选地至少具有一个取代基)或杂环基(可选地至少具有一个取代基),R.sup.4和R.sup.5均为氢或卤素,R.sup.6和R.sup.8均为氢、卤素、低碳基、羟基、低碳硫基、氨基(可选地用低碳基取代)或低碳氧基(可选地用羟基、低碳氧基、氨基、低碳基氨基和芳基(可选地用低碳氧基取代)中的一种取代基取代),R.sup.7为氢或低碳基,A为低碳亚烷基,Q为O或N--,R.sup.9为氢或酰基,但当X.sup.1为C--R.sup.6时,R.sup.3不为氢,其中R.sup.6为氢,以及其药学上可接受的盐。