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双(3-氨基-4-羟基苯基)甲酮 | 22445-98-3

中文名称
双(3-氨基-4-羟基苯基)甲酮
中文别名
——
英文名称
4,4'-dihydroxy-3,3'-diaminobenzophenone
英文别名
Bis(3-amino-4-hydroxyphenyl)methanone
双(3-氨基-4-羟基苯基)甲酮化学式
CAS
22445-98-3
化学式
C13H12N2O3
mdl
——
分子量
244.25
InChiKey
AEWGGPYHSLODJJ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.2
  • 重原子数:
    18
  • 可旋转键数:
    2
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    110
  • 氢给体数:
    4
  • 氢受体数:
    5

SDS

SDS:d8479b98f5c3ee50c557208e73ee82ca
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上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    4,4'-二氯二苯甲酮硫酸 、 palladium 10% on activated carbon 、 硝酸一水合肼 、 sodium hydroxide 作用下, 以 乙醇 为溶剂, 反应 30.0h, 生成 双(3-氨基-4-羟基苯基)甲酮
    参考文献:
    名称:
    4,4’-二羟基-3,3’-二氨基二苯甲酮的制备方 法
    摘要:
    本发明公开了一种4,4’‑二羟基‑3,3’‑二氨基二苯甲酮的制备方法,其其特点是采用氯苯和对氯苯甲酰氯普通有机试剂为原料经过以下四步有机反应制备目标产物。具体地说,本发明是通过无污染且具有很高工业应用价值的4,4’‑二氯‑3,3’‑二硝基二苯甲酮来制备水解产物4,4’‑二羟基‑3,3’‑二硝基二苯甲酮,再选择无污染、且工艺简单的水合肼还原法来制备4,4’‑二羟基‑3,3’‑二氨基二苯甲酮。
    公开号:
    CN104478744B
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文献信息

  • RESIN COMPOSITION
    申请人:TORAY INDUSTRIES, INC.
    公开号:US20190241716A1
    公开(公告)日:2019-08-08
    The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.
    本发明提供了一种树脂组合物,具有高灵敏度,并用于生产具有低吸水率的固化膜。该树脂组合物包括:(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物,其中酚羟基化合物中的单价基在邻位上,和/或(b2)含有羧基的芳香酰胺酸化合物,其中羧基化合物中的单价基在邻位上,其通式如下所示:在通式(1)中,X是一个单价有机基,具有含有2到20个碳原子的烷基,并直接连接到通式(1)中的羰基碳,或具有—(YO)n—的单价有机基;在通式(2)中,U是一个单价有机基,具有含有2到20个碳原子的烷基,并直接连接到通式(2)中的酰胺氮,或具有—(YO)n—的单价有机基;其中Y是含有1到10个碳原子的烷基,n是1到20的整数。
  • Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
    申请人:Nippon Kayaku Kabushiki Kaisha
    公开号:US20200392079A1
    公开(公告)日:2020-12-17
    This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.
    这种化合物具有优异的溶剂溶解性和与树脂的兼容性,可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式(1)表示,其中在公式(1)中,R1、R2、R3、R5和R6代表羟基或烷氧基;R4分别表示含硫醚键的有机基团;R7和R9分别代表氢原子或1至4个碳的烷基基团;R8代表烷基或芳基;X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物;一种光敏树脂组合物可以包括上述光聚合引发剂,从中可以得到高灵敏度且无金属腐蚀的固化产物。
  • NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
    申请人:TOKYO UNIVERSITY OF SCIENCE FOUNDATION
    公开号:US20180370908A1
    公开(公告)日:2018-12-27
    The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).
    本发明的目的是提供一种新的化合物,该化合物可以在受到活性能量射线照射时产生碱和自由基;一种包含该新化合物的光聚合引发剂;以及一种含有光聚合引发剂的光敏树脂组合物,该组合物具有高灵敏度和良好的储存稳定性,并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式(1)表示:(其中,R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等;X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基;n表示1至6的整数)。
  • NOVEL FLUORINE-CONTAINING DICARBOXYLIC ACIDS AND THEIR NOVEL POLYMER COMPOUNDS
    申请人:Narizuka Satoru
    公开号:US20090030173A1
    公开(公告)日:2009-01-29
    Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
    本发明公开了一种含氟的二羧酸,其化学式表示为(1),其中n表示1-4的整数,两个羧基不相邻于芳环上。通过将含氟二羧酸与共聚单体(例如,二氨基二醇)反应,可以获得线性聚合物化合物。通过热环化,这种线性聚合物化合物可以转化为具有优异特性的另一种聚合物化合物。
  • BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
    申请人:Katayama Mami
    公开号:US20110086311A1
    公开(公告)日:2011-04-14
    A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
    一种光敏树脂组合物,具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点,其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂,以及一种聚合物前体,该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
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