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5-methyl-hept-3-yne-2,5-diol | 56503-79-8

中文名称
——
中文别名
——
英文名称
5-methyl-hept-3-yne-2,5-diol
英文别名
5-Methyl-hept-3-in-2,5-diol;3-Methyl-heptin-(4)-diol-(3,6);5-Methyl-3-heptyne-2,5-diol;5-methylhept-3-yne-2,5-diol
5-methyl-hept-3-yne-2,5-diol化学式
CAS
56503-79-8
化学式
C8H14O2
mdl
——
分子量
142.198
InChiKey
FJSBTVGVJCPFNU-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    98.5-99 °C(Press: 3 Torr)
  • 密度:
    0.9703 g/cm3

计算性质

  • 辛醇/水分配系数(LogP):
    0.4
  • 重原子数:
    10
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.75
  • 拓扑面积:
    40.5
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

点击查看最新优质反应信息

文献信息

  • Acetylenic diol ethylene oxide/propylene oxide adducts and their use
    申请人:Air Products and Chemicals, Inc.
    公开号:EP2441744A1
    公开(公告)日:2012-04-18
    This invention provides water-based compositions, particularly coating, ink, fountain solution and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of an acetylenic diol ethylene oxide/propylene oxide adduct of the structure where r and t are 1 or 2, (n + m) is 1 to 30 and (p + q) is 1 to 30. Use of such adducts as surfactant in photoresist developer/electronics cleaning compositions is particularly advantageous. Also disclosed is a method for making random and block EO/PO adducts of acetylenic diols by reacting an acetylenic diol with EO and/or PO in the presence of a trialkylamine or Lewis acid.
    本发明提供的水基组合物,尤其是涂料、墨水、润发液和农用组合物,通过加入表面张力降低量的结构为乙炔二醇环氧乙烷/环氧丙烷加合物,可降低平衡表面张力和动态表面张力。 其中 r 和 t 为 1 或 2,(n + m) 为 1 至 30,(p + q) 为 1 至 30。在光阻显影剂/电子清洗组合物中使用此类加合物作为表面活性剂尤其有利。 本发明还公开了一种制造乙炔二醇的无规和嵌段 EO/PO 加合物的方法,该方法是在三烷基胺或路易斯酸存在下,使乙炔二醇与 EO 和/或 PO 反应。
  • Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture
    申请人:——
    公开号:US20020055660A1
    公开(公告)日:2002-05-09
    This invention provides water-based compositions, particularly coating, ink, fountain solution and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of an acetylenic diol ethylene oxide/propylene oxide adduct of the structure 1 where r and t are 1 or 2, (n+m) is 1 to 30 and (p+q) is 1 to 30. Also disclosed is a method for making random and block EO/PO adducts of acetylenic diols by reacting an acetylenic diol with EO and/or PO in the presence of a trialkylamine or Lewis acid.
    本发明提供的水基组合物,尤其是涂料、墨水、润发液和农用组合物,通过加入表面张力降低量的乙炔二元醇环氧乙烷/环氧丙烷加合物,可降低平衡表面张力和动态表面张力,其结构式为 1 其中 r 和 t 为 1 或 2,(n+m) 为 1 至 30,(p+q) 为 1 至 30。 还公开了一种制造乙炔二醇的无规和嵌段环氧乙烷/环氧丙烷加合物的方法,该方法是在三烷基胺或路易斯酸存在下,使乙炔二醇与环氧乙烷和/或环氧丙烷反应。
  • Microcapsule containing phase-change material and nucleating agent
    申请人:——
    公开号:US20040071967A1
    公开(公告)日:2004-04-15
    This invention provides water-based compositions, particularly coating, ink, fountain solution and agricultural compositions, manifesting reduced equilibrium and dynamic surface tension by the incorporation of a surface tension reducing amount of an acetylenic diol ethylene oxide/propylene oxide adduct of the structure where r and f are 1 or 2, (n+m) is 1 to 30 and (p+q) is 1 to 30. Use of such adducts as surfactants in photoresist developer/electronics cleaning compositions is particularly advantageous. Also disclosed is a method for making random and block EO/PO adducts of acetylenic diols by reacting an acetylenic diol with EO and/or PO in the presence of a trialkyiamine or Lewis acid. 1
    本发明提供的水基组合物,特别是涂料、墨水、润发液和农用组合物,通过加入表面张力降低量的乙炔二醇环氧乙烷/环氧丙烷加合物,可降低平衡和动态表面张力,其结构如下:r和f为1或2,(n+m)为1至30,(p+q)为1至30。在光阻显影剂/电子清洗组合物中使用这种加合物作为表面活性剂特别有利。 本发明还公开了一种通过乙炔二醇与 EO 和/或 PO 在三烷基胺或路易斯酸存在下反应制得乙炔二醇的无规和嵌段 EO/PO 加合物的方法。 1
  • Preparation of acetylenic ?-diols, and some of their reactions
    作者:M. F. Shostakovskii、V. M. Vlasov、A. A. Vasil'eva
    DOI:10.1007/bf00845312
    日期:1964.4
  • Mauge et al., Bulletin de la Societe Chimique de France, 1956, p. 425,428
    作者:Mauge et al.
    DOI:——
    日期:——
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