申请人:Hoechst Aktiengesellschaft
公开号:US05442087A1
公开(公告)日:1995-08-15
The invention relates to monomers of the formulae R.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2 and R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2, in which R.sup.1 is a (C.sub.1 -C.sub.20)alkyl, (C.sub.3 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.14)aryl or (C.sub.7 -C.sub.20) aralkyl radical, individual methylene groups in the radicals containing alkyl being optionally replaced by heteroatoms, R.sup.2 is a (C.sub.3 -C.sub.11)alkyl, (C.sub.3 -C.sub.11 )alkenyl or (C.sub.7 -C.sub.11)aralkyl radical, R.sup.3 is an unsubstituted or substituted (C.sub.1 -C.sub.6)alkyl, (C.sub.3 -C.sub.6)cycloalkyl, (C.sub.6 -C.sub.4)aryl or (C.sub.7 -C.sub.20)aralkyl radical and R.sup.4 is a hydrogen atom or a methyl group. It further relates to polymers having at least 5 mol % of units with pendent groups of the formula(e) --R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I) and/or --R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II), and to a radiation-sensitive mixture which contains: a) a compound which under the influence of actinic radiation forms acid, and b) an acid-cleavable compound whose cleavage products in an aqueous-alkaline developer have a higher solubility than the starting compound, in which the acid-cleavable compound is a polymer of the abovementioned type, and to a recording material comprising a support and a radiation-sensitive layer. The mixture according to the invention is particularly suitable for preparing offset printing plates and photoresists.
该发明涉及以下式R.sup.1 --SO.sub.2 --N(CO--OR.sup.2)--R3--O--CO--CR.sup.4 .dbd.CH.sub.2和R.sup.1 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.3 --O--CO--CR.sup.4 .dbd.CH.sub.2的单体,其中R.sup.1是(C.sub.1 -C.sub.20)烷基,(C.sub.3 -C.sub.10)环烷基,(C.sub.6 -C.sub.14)芳基或(C.sub.7 -C.sub.20)芳基烷基基团,碳链中的个别亚甲基团可选择性地被杂原子取代,R.sup.2是(C.sub.3 -C.sub.11)烷基,(C.sub.3 -C.sub.11)烯基或(C.sub.7 -C.sub.11)芳基烷基基团,R.sup.3是未取代或取代的(C.sub.1 -C.sub.6)烷基,(C.sub.3 -C.sub.6)环烷基,(C.sub.6 -C.sub.4)芳基或(C.sub.7 -C.sub.20)芳基烷基基团,R.sup.4是氢原子或甲基基团。该发明还涉及具有至少5摩尔%含有侧链基团的聚合物,其化学式为--R.sub.3 --N(CO--OR.sup.2)--SO.sub.2 --R.sup.1 (I)和/或--R.sup.3 --SO.sub.2 --N(CO--OR.sup.2)--R.sup.1 (II),以及含有以下成分的辐射敏感混合物:a)在光敏辐射的影响下形成酸的化合物,和b)酸可解离化合物,其在水性碱性显影剂中的裂解产物的溶解度高于起始化合物,其中酸可解离化合物是上述类型的聚合物,以及包括支撑体和辐射敏感层的记录材料。根据该发明的混合物特别适用于制备胶印版和光刻胶。