申请人:Hoechst-Roussel Pharmaceuticals Inc.
公开号:US05102891A1
公开(公告)日:1992-04-07
There are disclosed various compounds of the formula below, ##STR1## where n is 0 or 1; X is hydrogen, halogen, nitro, amino, trifluoromethyl, loweralkyl, or loweralkoxy; Y is hydrogen, halogen, nitro, amino, trifluoromethyl, loweralkyl, or loweralkoxy; R.sub.1 is hydrogen, loweralkyl, arylloweralkyl, loweralkenyl, loweralkynyl, loweralkanoyl, arylloweralkanoyl, heteroarylloweralkyl or heteroarylloweralkanoyl; R.sub.2 is hydrogen, loweralkyl, formyl or cyano; R.sub.3 is hydrogen or loweralkyl; R.sub.4 is loweralkyl, arylloweralkyl, cycloalkyl, aryl or heteroaryl; or alternatively, --NR.sub.3 R.sub.4 taken together constitutes ##STR2## R.sub.5 being hydrogen, loweralkyl, aryl, arylloweralkyl, heteroaryl or heteroarylloweralkyl, which compounds are useful for the treatment of various memory dysfunctions characterized by a cholinergic deficit such as Alzheimer's disease.
下面公开了以下式的各种化合物,其中n为0或1;X为氢、卤素、硝基、氨基、三氟甲基、较低烷基或较低烷氧基;Y为氢、卤素、硝基、氨基、三氟甲基、较低烷基或较低烷氧基;R.sub.1为氢、较低烷基、芳基较低烷基、较低烯基、较低炔基、较低酰基、芳基较低酰基、杂芳基较低烷基或杂芳基较低酰基;R.sub.2为氢、较低烷基、甲酰基或氰基;R.sub.3为氢或较低烷基;R.sub.4为较低烷基、芳基较低烷基、环烷基、芳基或杂芳基;或者,--NR.sub.3 R.sub.4一起构成##STR2##,其中R.sub.5为氢、较低烷基、芳基、芳基较低烷基、杂芳基或杂芳基较低烷基,这些化合物对于治疗由胆碱缺乏引起的各种记忆功能障碍,如阿尔茨海默病,是有用的。