The invention describes the use of oxime alkyl sulfonate compounds of formula 1
1
R
0
is either an R
1
—X group or R
2
;
X is a direct bond, an oxygen atom or a sulfur atom;
R
1
is hydrogen, C
1
-C
4
alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C
1
-C
4
alkyl and C
1
-C
4
-alkyloxy;
R
2
is hydrogen or C
1
-C
4
alkyl; and
R
3
is straight-chain or branched C
1
-C
12
alkyl which is unsubstituted or substituted by one or more than one halogen atom;
as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
该发明描述了使用氧
肟基烷基
磺酸盐化合物的公式11,其中R0是R1-X基团或R2;X是直接键,氧原子或
硫原子;R1是氢,C1-C4烷基或未取代或取代为
氯,
溴,C1-C4烷基和C1-C4-烷氧基的苯基;R2是氢或C1-C4烷基;和R3是直链或支链C1-C12烷基,未取代或取代为一个或多个卤素原子;作为
化学增感光阻剂中的光敏添加剂,该
化学增感光阻剂在碱性介质中可显影,并且对340至390纳米波长范围内的辐射敏感,相应地组成正/负光阻剂。