Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
申请人:——
公开号:US20040013974A1
公开(公告)日:2004-01-22
The invention describes the use of oxime alkyl sulfonate compounds of formula 1
1
R
0
is either an R
1
—X group or R
2
;
X is a direct bond, an oxygen atom or a sulfur atom;
R
1
is hydrogen, C
1
-C
4
alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C
1
-C
4
alkyl and C
1
-C
4
-alkyloxy;
R
2
is hydrogen or C
1
-C
4
alkyl; and
R
3
is straight-chain or branched C
1
-C
12
alkyl which is unsubstituted or substituted by one or more than one halogen atom;
as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
Copper-mediated synthesis of fullerooxazoles from [60]fullerene and <i>N</i>-hydroxybenzimidoyl cyanides
作者:Qing-Song Liu、Wen-Jie Qiu、Wen-Qiang Lu、Guan-Wu Wang
DOI:10.1039/d2ob00239f
日期:——
efficient copper-mediated [3 + 2] heteroannulation reaction of [60]fullerene with N-hydroxybenzimidoyl cyanides has been developed for the synthesis of fullerooxazoles. A possible reaction mechanism involving unique C–CN and N–OH bond cleavages and subsequent C–OH bond formation for N-hydroxybenzimidoyl cyanides is proposed to explain the generation of fullerooxazoles. In addition, the formed fullerooxazoles