Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.
非离子型光生酸(PAG)化合物被制备出来,它们含有一个含有
全氟取代基的芳酮基团,该取代基位于酮羰基的α位置。这些非聚合PAGs在暴露于高能辐射,如深紫外或极紫外光时,会释放出
磺酸。在100°C至150°C的后曝光烘烤(PEB)下,光生成的
磺酸在暴露的抵抗层中具有较低的扩散速率,从而在开发后形成良好的线条图案。在较高温度下,PAGs也可以通过热反应形成
磺酸。
全氟取代基提供了改善的热稳定性和
水解/亲核稳定性。