Ultraviolet absorber composition and resin composition stabilized with the absorber composition
申请人:Fujifilm Corporation
公开号:EP2267067A1
公开(公告)日:2010-12-29
An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm:
R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive σp value in Hammett equation.
提供了一种紫外线吸收剂组合物,其中包括:一种由式 (I) 代表的化合物;以及一种紫外线吸收剂,其最大吸收波长为 340 至 400 纳米:
R1a、R1b、R1c、R1d、R1e、R1f、R1g、R1h、R1i 和 R1j 各自独立地代表氢原子或除 OH 以外的单价取代基,或 R1a、R1b、R1c、R1d、R1e、R1f、R1g、R1h、R1i 和 R1j 中的相邻两个可结合在一起形成一个环;R1k、R1m、R1n 和 R1p 各自独立地代表一个氢原子或一个一价取代基,或 R1k、R1m、R1n 和 R1p 中相邻的两个可结合在一起形成一个环;且 R1a、R1b、R1c、R1d、R1e、R1f、R1g、R1h、R1i、R1j、R1k、R1m、R1n 和 R1p 中至少有一个是在哈密方程中具有正 σp 值的取代基。