Sulfonium salt compound, photoresist composition and method for patterning by employing same
申请人:NEC Corporation
公开号:US06528232B1
公开(公告)日:2003-03-04
A sulfonium salt compound designated by a general formula (I), a photoresist composition containing the sulfonium salt compound and a method for patterning by employing the sulfonium salt compound. In the general formula (I), R1 and R2 are independently selected from the group consisting of a linear alkyl group, a branched alkyl group, a monocyclic alkyl group and a cross-linked cyclic alkyl group, or R1 and R2 having the saturated alkyl group are linked to each other forming a ring or R1 and R2 are linked to each other forming a ring having a substituted oxo group, R3, R4, R5 and R6 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group and an alkoxy group having 1 to 4 carbon atoms, X is selected from the group consisting of —CH2—, —C2H4— and —OCH2— (wherein an oxy group is bonded to a benzene ring), and Y− is a counter ion
一种由一般式(I)指定的磺鎵盐化合物,包含该磺鎵盐化合物的光阻组合物以及利用该磺鎵盐化合物进行图案化的方法。在一般式(I)中,R1和R2是从线性烷基,支链烷基,单环烷基和交联环烷基组成的群体中独立选择的,或者具有饱和烷基的R1和R2相互连接形成环,或者R1和R2相互连接形成具有取代氧羰基的环,R3、R4、R5和R6是从氢原子、卤素原子、烷基和具有1至4个碳原子的烷氧基组成的群体中独立选择的,X是从—CH2—,—C2H4—和—OCH2—(其中氧基与苯环键合)组成的群体中选择的,而Y−是一个反离子。