申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:US20140221673A1
公开(公告)日:2014-08-07
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R
1
represents a sulfur atom or an oxygen atom; R
2
represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.
一种抗蚀组合物,包括基础组分(A),在酸的作用下在显影溶液中表现出改变的溶解性,以及在暴露后生成酸的酸发生器组分(B),基础组分(A)包含具有下述通用式(a5-0)所示的结构单元(a5)的聚合物化合物(A1)(R1代表硫原子或氧原子;R2代表单键或二价连接基团;Y代表芳香烃基团或具有多环基团的脂肪烃基团,前提是芳香烃基团或脂肪烃基团可以有其中的碳原子或氢原子被取代的取代基)。