N-[2,2,2-三氯-1,1-二(4-氯苯基)乙基]乙酰胺 | 81012-95-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: N-[2,2,2-三氯-1,1-二(4-氯苯基)乙基]乙酰胺
• 英文名称: N-<1,1-Bis-(4-chlor-phenyl)-2,2,2-trichlor-aethyl>-acetamid
• 英文别名: N-(2,2,2-trichloro-1,1-bis(4-chlorophenyl)ethyl)acetamide；N-[2,2,2-Trichloro-1,1-bis(4-chlorophenyl)ethyl]acetamide
• CAS: 81012-95-5
• 化学式: C₁₆H₁₂Cl₅NO
• 分子量: 411.542
• InChiKey: MCSLBZGLEIGWTI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.7
• 重原子数：
  23
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.19
• 拓扑面积：
  29.1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  三氯杀螨醇 、 乙腈 在 硫酸 作用下， 生成 N-[2,2,2-三氯-1,1-二(4-氯苯基)乙基]乙酰胺
  参考文献：
  名称：

  The Ritter Reaction of Tertiary Trihalomethylcarbinols and Related Substances

  摘要：

  DOI：

  10.1021/jo01047a527

文献信息

• NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS
  申请人：Aqad Emad

  公开号：US20110269074A1

  公开（公告）日：2011-11-03

  New polymers are provided comprising (i) one or more covalently linked photoacid generator moieties and (ii) one or more photoacid-labile groups, wherein the one or more photoacid generator moieties are a component of one or more of the photoacid-labile groups. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-200 nm, particularly 193 nm.

  提供了新的聚合物，包括（i）一个或多个共价连接的光酸发生剂基团和（ii）一个或多个光酸敏感基团，其中一个或多个光酸发生剂基团是一个或多个光酸敏感基团的组成部分。本发明的优选聚合物适用于在短波长下进行成像的光阻，例如亚200纳米，特别是193纳米。
• Near UV photoresist
  申请人：SHIPLEY COMPANY INC.

  公开号：EP0423446A1

  公开（公告）日：1991-04-24

  A photoacid-generating photoresist composition sensitized with an aromatic, multi-ring, heterocylcic nitrogen containing sensitizer, preferably a ring extended phenothiazine derivative. The use of the sensitizer permits exposure of photoresists to near UV irradiation where such photoresists have heretofore been exposed to deep UV irradiation. The invention is especially useful for acid hardening photoresist systems.

  一种产生光酸的光刻胶组合物，使用芳香族、多环、杂环含氮敏化剂（最好是环状延伸的吩噻嗪衍生物）进行敏化。使用增感剂可以使光刻胶暴露在近紫外线辐照下，而此前此类光刻胶只能暴露在深紫外线辐照下。本发明尤其适用于酸性硬化光刻胶体系。
• Light-sensitive composition and process
  申请人：SHIPLEY COMPANY INC.

  公开号：EP0502382A1

  公开（公告）日：1992-09-09

  A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl compound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.

  一种光成像组合物及其使用方法。该组合物包括由酚醛树脂和多功能环氧树脂或乙烯基化合物混合物组成的粘合剂，以及由能产生交联粘合剂组分的固化催化剂的光活性化合物组成的固化体系。该组合物的使用过程包括将该组合物涂在基材上，干燥基材，将干燥的涂层暴露在活化辐射下，在光暴露区域固化粘合剂，显影涂层和热固化显影图像。该组合物特别适用于焊接掩模。
• Radiation sensitive composition comprising polymer having inert blocking groups
  申请人：Shipley Company, L.L.C.

  公开号：EP0732626A2

  公开（公告）日：1996-09-18

  A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.

  一种光刻胶组合物，由酸或碱发生剂、在酸或碱存在下活化的交联剂和碱溶性树脂（最好是酚醛树脂）组成，其中酚醛羟基的一部分经反应形成对酸或碱惰性的封端基团。惰性封端基团的存在使曝光的光刻胶能够用强显影剂显影，而不会在细线特征之间形成微桥。
• Copolymers and photoresist compositions comprising copolymer resin binder component
  申请人：Shipley Company, L.L.C.

  公开号：EP0813113A1

  公开（公告）日：1997-12-17

  The present invention provides novel copolymers and photoresist compositions that contain such copolymers as a resin binder component. Preferred copolymers include three distinct repeating units: 1) units that contain acid-labile groups; 2) units that are free of both reactive and hydroxy moieties; and 3) units that contribute to aqueous developability of a photoresist containing the copolymer as a resin binder. Photoresists of the invention exhibit surprising lithographic improvements including substantially enhanced plasma etch resistance and isolated line performance as well as good dissolution rate control.

  本发明提供了新型共聚物以及含有此类共聚物作为树脂粘合剂成分的光刻胶组合物。优选的共聚物包括三种不同的重复单元：1）含有酸性基团的单元；2）不含活性和羟基的单元；3）有助于含有共聚物作为树脂粘合剂的光刻胶的水性显影性的单元。本发明的光刻胶显示出惊人的光刻性能改进，包括大大增强的抗等离子刻蚀性能和隔离线性能，以及良好的溶解速率控制。

表征谱图