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4-巯基对苯二甲酸 | 82520-79-4

中文名称
4-巯基对苯二甲酸
中文别名
——
英文名称
4-mercaptophthalic acid
英文别名
4-Mercapto-phthalsaeure;4-Sulfhydryl-phthalsaeure;4-sulfanylphthalic acid
4-巯基对苯二甲酸化学式
CAS
82520-79-4
化学式
C8H6O4S
mdl
——
分子量
198.199
InChiKey
FZUUAPPKEJXGEN-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    432.8±40.0 °C(Predicted)
  • 密度:
    1.559±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    1.1
  • 重原子数:
    13
  • 可旋转键数:
    2
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    75.6
  • 氢给体数:
    3
  • 氢受体数:
    5

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

点击查看最新优质反应信息

文献信息

  • COMPOUNDS AND METHODS FOR THE TARGETED DEGRADATION OF ANDROGEN RECEPTOR
    申请人:Arvinas, Inc.
    公开号:US20180099940A1
    公开(公告)日:2018-04-12
    The present disclosure relates to bifunctional compounds, which find utility to degrade and (inhibit) Androgen Receptor. In particular, the present disclosure is directed to compounds, which contain on one end a cereblon ligand which binds to the E3 ubiquitin ligase and on the other end a moiety which binds Androgen Receptor, such that Androgen Receptor is placed in proximity to the ubiquitin ligase to effect degradation (and inhibition) of Androgen Receptor. The present disclosure exhibits a broad range of pharmacological activities associated with compounds according to the present disclosure, consistent with the degradation/inhibition of Androgen Receptor.
    本公开涉及双功能化合物,其用于降解和(抑制)雄激素受体。具体而言,本公开涉及包含一端结合到E3泛素连接酶的谷氨酰腺苷环配体,另一端结合到雄激素受体的部分的化合物,使得雄激素受体与泛素连接酶靠近,以实现雄激素受体的降解(和抑制)。本公开展示了与根据本公开涉及的化合物相关的广泛的药理活性范围,与雄激素受体的降解/抑制一致。
  • CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND MERCAPTO COMPOUND
    申请人:TOKYO OHKA KOGYO CO., LTD.
    公开号:US20190121233A1
    公开(公告)日:2019-04-25
    A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) in the nonresist portion; and the generation of development residue when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the photosensitive resin composition. A mercapto compound having a specific structure is included in the photosensitive resin composition, and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation, and a resin whose solubility in alkali increases under the action of acid.
    一种化学增感型正型光敏树脂组合物,能够抑制“足部”现象的发生,即底部(靠近支撑表面的一侧)的宽度变窄,小于顶部(靠近抗蚀层表面的一侧)的宽度,同时在使用该光敏树脂组合物在基板的金属表面上形成用作电镀物品模板的抗蚀图案时,能够减少残留物的产生。该光敏树脂组合物中包含一种具有特定结构的巯基化合物,其中包括一个酸发生剂,该酸发生剂在暴露于辐射活性光线或辐射时产生酸,以及一种树脂,在酸的作用下其在碱性溶液中的溶解度增加。
  • [EN] BENZENE, PYRIDINE, NAPHTALENE OR BENZOPHENONE DERIVATIVES AS INHIBITORS OF SQUALENE SYNTHETASE AND PROTEIN FARNESYLTRANSFERASE<br/>[FR] DERIVES DE BENZENE, PYRIDINE, NAPHTALENE OU BENZOPHENONE UTILISES COMME INHIBITEURS DE LA SQUALENE SYNTHETASE ET DE LA PROTEINE FARNESYLTRANSFERASE
    申请人:ABBOTT LABORATORIES
    公开号:WO1996034851A1
    公开(公告)日:1996-11-07
    (EN) The present invention provides a compound of formula (I), (II), (III) or (IV), processes for the preparation of the compounds of the invention, intermediates useful in these processes, a pharmaceutical composition, and methods of using the compounds of the invention.(FR) La présente invention se rapporte à des composés de la formule (I), (II), (III) ou (IV), aux procédés de préparation de ces composés, aux intermédiaires utilisés dans ces procédés, à une composition pharmaceutique et aux procédés d'utilisation de ces composés.
    该发明提供了公式(I),(II),(III)或(IV)的化合物,制备该发明化合物的方法,这些方法中有用的中间体,制药组合物以及使用该发明化合物的方法。
  • METHOD OF PRODUCING A METAL PHTHALOCYANINE COMPOUND, AND METHOD OF PRODUCING A PHTHALOCYANINE COMPOUND AND AN ANALOGUE THEREOF
    申请人:Tateishi Keiichi
    公开号:US20090247742A1
    公开(公告)日:2009-10-01
    A method of producing a metal phthalocyanine compound, which contains: conducting a reaction between at least two compounds selected from among Compounds A to F of formula (I), and a metal compound, in a buffer solution of an organic base or an inorganic base and an acid, in the presence of a dehydrating agent: wherein R is a hydrogen atom or a substituent; l is an integer of 0 to 4; a plurality of Rs may be the same or different from each other when l is 2 to 4; and G is a group of atoms necessary for forming at least one of a 5- or 6-membered aromatic ring and a 5- or 6-membered hetero ring.
    生产金属酞菁化合物的方法,包括:在有机碱或无机碱和酸的缓冲溶液中,在脱水剂的存在下,将公式(I)中的至少两种化合物A至F和金属化合物反应,其中R是氢原子或取代基;l是0到4的整数;当l为2到4时,多个R可以相同或不同;G是必要的原子团,用于形成5或6元芳香环和5或6元杂环中的至少一个。
  • Thermal ink-jet ink and ink cartridge using the ink
    申请人:Canon Kabushiki Kaisha
    公开号:EP1935949A1
    公开(公告)日:2008-06-25
    An ink cartridge for storing ink includes a thermal ink-jet head provided with a heating portion (H2107) that generates thermal energy for discharging the ink. The heating portion (H2107) has, on its surface in contact with the ink, a protective layer (H2106) containing at least one of a silicon oxide, a silicon nitride, and a silicon carbide. The ink contains a substance that dissolves the protective layer (H2106) and a compound represented by the following formula (1), and the content X (% by mass) of the compound of the formula (1) satisfies a relationship of 1 ≤ X ≤ 30:          R1-A-R2     Formula (1) wherein A represents one selected from -S-, -S(=O)-, and - S(=O)2-, and R1 and R2 each independently represent a group selected from a hydrogen atom, a hydroxyl group, an alkyl group, a hydroxyalkyl group, an alkenyl group, an acyl group, a carbamoyl group, a carboxyl group, and a sulfonyl group.
    一种用于存储墨水的墨盒包括一个热喷墨头,该喷墨头带有一个加热部分(H2107),该加热部分可产生热能用于释放墨水。加热部分 (H2107) 与墨水接触的表面上有一个保护层 (H2106),该保护层包含氧化硅、氮化硅和碳化硅中的至少一种。油墨中含有溶解保护层(H2106)的物质和下式(1)表示的化合物,式(1)化合物的含量 X(质量百分比)满足 1 ≤ X ≤ 30 的关系: R1-A-R2 式(1) 其中 A 代表选自-S-、-S(=O)-和-S(=O)2-的一个基团,R1 和 R2 各自独立地代表选自氢原子、羟基、烷基、羟烷基、烯基、酰基、氨基甲酰基、羧基和磺酰基的一个基团。
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