bis<<(2,6-dinitrobenzyl)oxy>carbonyl>hexane-1,6-diamine | 133795-16-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: bis<<(2,6-dinitrobenzyl)oxy>carbonyl>hexane-1,6-diamine
• 英文别名: bis[[(2,6-dinitrobenzyl)oxy]carbonyl]hexane-1,6-diamine；(2,6-dinitrophenyl)methyl N-[6-[(2,6-dinitrophenyl)methoxycarbonylamino]hexyl]carbamate
• CAS: 133795-16-1
• 化学式: C₂₂H₂₄N₆O₁₂
• 分子量: 564.466
• InChiKey: REPNLHVPISRIIU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  40
• 可旋转键数：
  13
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  260
• 氢给体数：
  2
• 氢受体数：
  12

反应信息

• 作为产物：
  描述：

  2,6-二硝基苄醇 、 1,6-己二异氰酸酯 在 甲基锂 作用下， 生成 bis<<(2,6-dinitrobenzyl)oxy>carbonyl>hexane-1,6-diamine
  参考文献：
  名称：

  从邻硝基苄基衍生的氨基甲酸酯光生有机碱

  摘要：

  已经研究了有机碱的新型光前体的设计以及控制其量子效率转化为游离胺或二胺的空间和电子因素。基本设计涉及用光不稳定 [(o-nitrobenzyl)oxy] 羰基或 α-取代类似物保护胺。所得受保护的胺的光敏感性归功于经典的邻硝基苄基光重排，并且在用低于 400 nm 的紫外光照射时，可以在固态和溶液中干净地释放游离胺。探索了几种设计，其中光活性中心的结构有系统地变化，以研究各种空间和电子效应的影响。在所有情况下，

  DOI：

  10.1021/ja00011a038

文献信息

• Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device
  申请人：TORAY INDUSTRIES, INC.

  公开号：US10409163B2

  公开（公告）日：2019-09-10

  To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A).

  提供一种光敏树脂组合物，该组合物能够形成高分辨率的图案并获得具有优异耐热性和抗裂性的固化膜，而且还可进行碱显影；提供一种方法，该方法能够缩短在半导体衬底上形成杂质区后去除该组合物固化膜所需的步骤；以及提供一种使用该组合物制造半导体器件的方法。本发明公开了一种包括聚硅氧烷（A）的光敏树脂组合物。
• PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20170285477A1

  公开（公告）日：2017-10-05

  To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A), wherein the polysiloxane (A) is a polysiloxane represented by the general formula (1), and wherein (X) and (Y) are represented by the general formulas (4) to (6). 7.5≦( X )≦75  (4) 2.5≦( Y )≦40  (5) 1.5×( Y )≦( X )≦3×( Y )  (6)
• Photogeneration of organic bases from o-nitrobenzyl-derived carbamates
  作者：James F. Cameron、Jean M. J. Frechet

  DOI：10.1021/ja00011a038

  日期：1991.5

  that control their quantum-efficient transformation into free amines or diamines have been investigated. The basic design involves the protection of amines with photolabile [(o-nitrobenzyl)oxy]carbonyl groups or α-substituted analogues. The resulting protected amines owe their light sensitivity to the classical o-nitrobenzyl photorearrangement and cleanly liberate free amine in both the solid state

  已经研究了有机碱的新型光前体的设计以及控制其量子效率转化为游离胺或二胺的空间和电子因素。基本设计涉及用光不稳定 [(o-nitrobenzyl)oxy] 羰基或 α-取代类似物保护胺。所得受保护的胺的光敏感性归功于经典的邻硝基苄基光重排，并且在用低于 400 nm 的紫外光照射时，可以在固态和溶液中干净地释放游离胺。探索了几种设计，其中光活性中心的结构有系统地变化，以研究各种空间和电子效应的影响。在所有情况下，