Composition for film formation, method of film formation, and silica-based film
申请人:JSR CORPORATION
公开号:US20030091838A1
公开(公告)日:2003-05-15
A composition for film formation which comprises:
(A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and an ammonium compound, and
(B) an organic solvent.