Alkali-soluble organopolysiloxanes useful in the alkali-developing resist materials for use in microprocesses in LSI device fabrication have the following general formula ##STR1## where A is a hydroxyphenyl group; R is an alkylene group having 1 to 4 carbon atoms; n is zero or one; R.sup.1 is an alkyl group having 1 to 4 carbon atoms; x and z are positive numbers; y is zero or a positive number; x, y, and z have values such that their ratios are 0.3.ltoreq.(x+y)/z.ltoreq.4; and zero.ltoreq.y/x.ltoreq.5.
适用于LSI器件制造中微处理用碱性显影阻抗材料的碱溶性有机聚
硅氧烷具有以下一般式##STR1## 其中A是羟基苯基基团;R是具有1到4个碳原子的烷基基团;n为零或一;R.sup.1是具有1到4个碳原子的烷基基团;x和z为正数;y为零或正数;x、y和z的值满足它们的比率为0.3.ltoreq.(x+y)/z.ltoreq.4;且0.ltoreq.y/x.ltoreq.5。